Pellicle assembly having a vented frame
Patent 5814381 Issued on September 29, 1998. Estimated Expiration Date: 
April 4, 2017. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
April 4, 2017. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesDust free storage container for a membrane assembly such as a pellicle and its method of use Removable pellicle and method Protective device for photographic masks Packaged optical pellicle Photochemically stable deep ultraviolet pellicles for excimer lasers Pellicle assembly with vent structure Patent #: 5529819 InventorAssigneeApplicationNo. 835106 filed on 04/04/1997US Classes:428/14, Peripheral enclosure or frame428/157, Differential nonuniformity at margin428/172, Composite web or sheet428/343Adhesive outermost layerExaminersPrimary: Thomas, Alexander S.Attorney, Agent or FirmInternational ClassesB32B 003/02B32B 003/30 AbstractA pellicle for isolating a photomask pattern from particulate contaminants. The pellicle includes a peripheral frame having at least one vent for the passage of a gaseous substance between the interior of the frame and the atmosphere outside of the frame. The vent is configured for removal of particulate contaminants from the gaseous substance before the gaseous substance flows into the interior of the frame. The vent includes a recess formed in a first edge of the frame and at least two inlets opening into the recess, one of which couples the recess to the interior cavity of the pellicle and the other of which couples the recess to the atmosphere outside of the frame. At least one inlet is located in the first edge of the frame. | |
