Multi-beam pitch adjustment system and method
Patent 5786594 Issued on July 28, 1998. Estimated Expiration Date: 
January 21, 2017. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
January 21, 2017. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesOptical scan apparatus having jitter amount measuring means Scanning optical device with aberration compensation feature Patent #: 5615038 Inventors
AssigneeApplicationNo. 786203 filed on 01/21/1997US Classes:250/236, Rotary motion358/474ScanningExaminersPrimary: Allen, Stephone B.Attorney, Agent or FirmForeign Patent References
International ClassH04N 001/36Foreign Application Priority Data1996-01-18 JPAbstractThe current disclosure discloses methods of and systems for automatically adjusting or selecting a pitch between beams in a multi-beam scanning system. An array of light sources is mounted on a rotatable housing and emits light in a direction perpendicular to the rotational plane. The system or method measures a pitch on or near an intermediate image-forming surface. In response to the measured pitch, the scanning as well as sub-scanning pitch is automatically adjusted or selected by rotating a housing unit to maintain a desired pitch.Other References
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