Off axis alignment system for scanning photolithography
Apparatus for detecting an in-focus position of a substrate surface having a movable light intercepting member and a thickness detector
Apparatus for detecting positions of marks in projection aligner wherein an auxiliary pattern is constructed to produce a signal level that is independent of the surface condition of a substrate Patent #: 5483349
ApplicationNo. 570924 filed on 12/12/1995
US Classes:250/548, Controlling web, strand, strip, or sheet356/401With registration indicia (e.g., scale)
ExaminersPrimary: Westin, Edward P.
Assistant: Giles, Alan L.
Attorney, Agent or Firm
Foreign Patent References
International ClassG01N 021/86
Foreign Application Priority Data1994-12-12 JP
AbstractA wafer is brought into focus with a projection optical system, and a wafer mark on the wafer is also brought into focus with an off-axis alignment sensor highly accurately according to an automatic focusing process. First, a deviation of the surface of the wafer from an image plane of the projection optical system is measured by an oblique-incidence main AF sensor. For measuring the position of the wafer mark with an imaging device of an alignment system, part of a focusing ray of light from the wafer passes through an optical system, which is not telecentric, composed of an AF relay system and a half beam shield plate, and is detected by the imaging device, whereupon an image of a focusing mark projected onto the wafer is formed on the imaging device. The position of the image of the focusing mark on the imaging device is calibrated on the basis of the deviation which has been measured by the oblique-incidence main AF sensor.