Apparatus and method for conditioning a chemical mechanical polishing pad
Patent 5775983 Issued on July 7, 1998. Estimated Expiration Date: 
July 7, 2015. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
July 7, 2015. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesAir-assisted buffing pad cleaning tool and associated cleaning methods Reconditioning tool for rotary faced buffing pad Method for conditioning the surface of a polishing pad Pneumatic pad conditioner Process for treating polishing cloths used for semiconductor wafers Polishing pad conditioning apparatus for wafer planarization process Patent #: 5216843 InventorsApplicationNo. 431934 filed on 05/01/1995US Classes:451/444, Tool cleaner451/285, Rotary work holder451/287Planar surface abradingExaminersPrimary: Smith, James G.Assistant: Banks, Derris H. Attorney, Agent or FirmInternational ClassesB24B 021/18B24B 033/00 B24B 047/26 B24B 055/00 AbstractA method and apparatus for conditioning a polishing pad improves the polishing characteristics of the pad by providing an embedded pattern that facilitates polishing and reduces glazing. Moreover, the present invention conditions a pad without significantly abrading the polishing surface, thereby prolonging the pad's useful life. A series of independently rotatable rollers having a knurled outer surface is used to embed a pattern of score marks in the surface of the polishing pad. Alternatively, a knurled conical roller engages a radius of the pad. The apparatus is adaptable to either manual or automated processes. The present invention is particularly useful for conditioning polishing pads used in the fabrication of semiconductor wafers.Field of SearchWith tool treating or formingWork rotating Rotary work holder Dressing Tool cleaner Rotary work holder By means loosely confining work Planar surface abrading Using film of etchant between a stationary surface and a moving surface (e.g., chemical lapping, etc.) Etchant contains solid particle (e.g., abrasive for polishing, etc.) Rotary or crush dressing | |
