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US Patent 5775983 - Apparatus and method for conditioning a chemical mechanical polishing pad
US Patent Issued on July 7, 1998
Estimated Patent Expiration Date:
July 7, 2015Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
Estimated Patent Expiration Date:
July 7, 2015Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.AbstractA method and apparatus for conditioning a polishing pad improves the polishing characteristics of the pad by providing an embedded pattern that facilitates polishing and reduces glazing. Moreover, the present invention conditions a pad without significantly abrading the polishing surface, thereby prolonging the pad's useful life. A series of independently rotatable rollers having a knurled outer surface is used to embed a pattern of score marks in the surface of the polishing pad. Alternatively, a knurled conical roller engages a radius of the pad. The apparatus is adaptable to either manual or automated processes. The present invention is particularly useful for conditioning polishing pads used in the fabrication of semiconductor wafers. | InventorsApplicationNo. 431934 filed on 05/01/1995US Classes:451/444, Tool cleaner451/285, Rotary work holder451/287Planar surface abradingField of Search451/56, With tool treating or forming451/242, Work rotating451/246, Rotary work holder451/443, Dressing451/444, Tool cleaner451/285, Rotary work holder451/286, By means loosely confining work451/287, Planar surface abrading216/88, Using film of etchant between a stationary surface and a moving surface (e.g., chemical lapping, etc.)216/89, Etchant contains solid particle (e.g., abrasive for polishing, etc.)125/11.03Rotary or crush dressingExaminersPrimary: Smith, James G.Assistant: Banks, Derris H. Attorney, Agent or FirmUS Patent References4959928, Air-assisted buffing pad cleaning tool and associated cleaning methodsIssued on: 10/02/1990 Inventor: Hartwig, Sr.5070570, Reconditioning tool for rotary faced buffing pad Issued on: 12/10/1991 Inventor: Sabo5081051, Method for conditioning the surface of a polishing pad Issued on: 01/14/1992 Inventor: Mattingly, et al.5154021, Pneumatic pad conditioner Issued on: 10/13/1992 Inventor: Bombardier, et al.5167667, Process for treating polishing cloths used for semiconductor wafers Issued on: 12/01/1992 Inventor: Prigge, et al.5216843Polishing pad conditioning apparatus for wafer planarization process Issued on: 06/08/1993 Inventor: Breivogel, et al. International ClassesB24B 021/18B24B 033/00 B24B 047/26 B24B 055/00 |
