Film measurement system with improved calibration
Patent 5771094 Issued on June 23, 1998. Estimated Expiration Date: 
January 29, 2017. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
January 29, 2017. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesRadiation measuring system Automatic wavelength calibration apparatus Apparatus for rapid and accurate analysis of the composition of samples Patent #: 5489980 InventorsAssigneeApplicationNo. 790090 filed on 01/29/1997US Classes:356/326, Utilizing a spectrometer356/328, Having diffraction grating means356/369Of surface reflectionExaminersPrimary: McGraw, Vincent P.Attorney, Agent or FirmInternational ClassesG01J 003/36G01N 021/21 AbstractThe pixel position-to-wavelength calibration function of film measurement devices such as spectroscopic ellipsometers and spectroreflectometers may shift due to temperature and humidity changes and mechanical factors. One or more wavelength markers provided by the light source or reference sample may be used to correct the calibration function. The pixel positions of one or more persistent wavelength markers are noted during the calibration process and the current positions of such markers are again noted to account for shifts due to various factors to correct the calibration function. | |
