Photopolymerizable compositions comprising alkoxyphenyl-substituted bisacylphosphine oxides
Patent 5767169 Issued on June 16, 1998. Estimated Expiration Date: 
February 14, 2016. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
February 14, 2016. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesBisacylphosphine oxides, the preparation and use thereof Bisacylphosphine oxides, the preparation and use thereof Photopolymerizable recording material, in particular for the production of printing plates and relief plates (Polyene-polythiol) dental compositions curable with visible light Patent #: 5100929 InventorsAssigneeApplicationNo. 601595 filed on 02/14/1996US Classes:522/64, Specified rate-affecting material contains phosphorous430/281.1, Radiation sensitive composition comprising ethylenically unsaturated compound430/916, Free radical430/923, Carbonyl compound containing522/18Specified rate-affecting material contains phosphorous, arsenic, antimony or nitrogen atomExaminersPrimary: Lesmes, George F.Assistant: Codd, Bernard Attorney, Agent or FirmForeign Patent References
International ClassC08F 002/46Foreign Application Priority Data1994-09-02 CHAbstractA photopolymerizable composition comprising (a) at least one ethylenically unsaturated photopolymerizable compound, and (b) alkoxyphenyl-substituted bisacylphosphine oxides of the formula I ##STR1## in which R1 and R2 are identical or different and are a radical of the formula II ##STR2## in which R4 and R5 independently of one another are C1 -C12 alkyl or C1 -C12 alkoxy, andR6, R7 and R8 independently of one another are hydrogen, C1 -C12 alkyl, C1 -C12 alkoxy or halogen,R3 is a radical of the formula III ##STR3## in which R9 is C1 -C20 alkyl, C2 -C20 alkyl, C5 -C6 cycloalkyl, phenyl, naphthyl, phenyl-C1 -C5 alkyl, C2 -C12 alkenyl, --CF3 or ##STR4## or R9 is a radical of the formula IV or V ##STR5## in which X is for example C1 -C16 alkylene, C4 -C12 alkenylene or is xylylene,R10 is for example hydrogen, C1 -C20 alkyl, C2 -C12 alkenyl, cyclopentyl, cyclohexyl, phenyl with 1 or 2 C1 -C4 alkyl and/or C1 -C4 alkoxy groups, or is C1 -C4 alkoxy,R11 is hydrogen, C1 -C20 alkyl, C2 -C12 alkenyl, cyclopentyl, cyclohexyl, phenyl, or is C1 -C4 alkoxy, or is a radical of the formula VI ##STR6## or R9 and R11, in the formula III together are ethylene, --CH2 CR14 R15 -- or --C(CH3)2 CH=CH--,orR10 and R11, together with the atoms to which they are attached, for example form a benzene ring,R12 is hydrogen or C1 -C4 alkoxy,R13 is C1 -C4 alkyl,R14 and R15 independently of one another are hydrogen, C1 -C8 alkyl, phenyl or --CH2 OR13, or R14 and R15, together with the carbon atom to which they attached, form a C5 -C6 cycloalkyl ring,Y is for example a single bond, --CR,6 R17 -- or --CH=CH--, R16 is hydrogen, methyl or ethyl,R17 is hydrogen or C1 -C4 alkyl,R18 is hydrogen, C1 -C12 alkyl or phenyl, andm is a number from 2-12, with the proviso that if the radical --OR9 in the formula III is in the p-position of the phenyl ring and R9 is methyl, at least one of the radicals R10, R11 and R12 is not hydrogen, are suitable for the photopolymerization of compounds containing ethylenically unsaturated bonds.Other References
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