Second harmonic generating apparatus and apparatus employing laser

Patent 5757827 Issued on May 26, 1998. Estimated Expiration Date:

April 18, 2017. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Abstract Claims Description Full Text

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Inventors

Assignee

Hitachi Metals, Ltd.

Application

No. 839388 filed on 04/18/1997

US Classes:

372/22, Frequency multiplying (e.g., harmonic generator)372/92, PARTICULAR RESONANT CAVITY372/98, Specified cavity component372/105Birefringent material

Examiners

Primary: Scott, Leon Jr.

Attorney, Agent or Firm

Staas & Halsey

Foreign Patent References

6204597 JP. 07/10/1994
WO-A-93 14542 WO. 07/10/1993

International Class

H01S 003/10

Foreign Application Priority Data

1994-07-26 JP

Abstract

A second harmonic generating apparatus including a semiconductor laser serving as a pumping source, a resonator structure for oscillating a first radiation wave generated by LiSAF (Cr:LiSrAlF6 : Lithium strontium aluminum fluoride with chromium added) crystal which is a solid-state laser crystal which is excited by the pumping source, a control element for controlling the wavelength of the first oscillation wave, and a nonlinear crystal for performing wavelength conversion into second harmonic which is a second oscillation wave, with the first oscillation wave serving as a fundamental wave, the nonlinear crystal being provided in the resonator. A higher efficiency and reliability of the second harmonic generating apparatus is achieved.