Developing solution for negative type photosensitive resin compositions

Patent 5756267 Issued on May 26, 1998. Estimated Expiration Date:

May 26, 2015. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Abstract Claims Description Full Text

Patent References

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Inventors

Application

No. 714407 filed on 05/29/1991

US Classes:

430/331, Finishing or perfecting composition or product430/309, Post imaging process430/325Post image treatment to produce elevated pattern

Examiners

Primary: Dote, Janis L.

Attorney, Agent or Firm

Sughrue, Mion, Zinn, Macpeak & Seas, PLLC

Foreign Patent References

0062733 EP 10/13/1982
63-228144 JP 09/13/1988

International Class

G03F 007/32

Foreign Application Priority Data

1990-05-29 JP

Abstract

A developing solution for negative type photo-sensitive resin compositions which comprises an aqueous solution containing 0.01 to 1.5% by weight of at least one compound selected from quaternary ammonium bases represented by formula (I): ##STR1## wherein R1, R2, R3 and R4 are the same or different, and are groups selected from the class consisting of alkyl and hydroxyalkyl groups, each group having 1 to 6 carbon atoms, and containing a nonionic, cationic or amphoteric surface active agent. The developing solution allows for development of sharp image patterns within a short period without forming mottles.