Method for removing moisture from chlorodifluoro-methane
Patent 5723702 Issued on March 3, 1998. Estimated Expiration Date: March 13, 2016. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
There is a process for removing moisture from chlorodifluoromethane (CHClF2) containing moisture in excess in the preparation of chlorodifluoromethane comprising lowering the partial pressure of water in the chlorodifluoromethane gas by contacting the chlorodifluoromethane gas with an aqueous solution of calcium chloride of more than 5% by weight.
Other References
Weissberger Separation and Purification Part 1, 2nd Ed, pp. 809, 816 (1956)
Encyclopedia of Chemical Technology, 3rd ed., 4:433, John Wiley & Sons (1984)
T.A. Wittstruck et al., "Some Hydrates of Some Halomethanes," J. Chem. Eng. Data, 6(3):343-346 (1961
March 13, 2016. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
