Surface inspection system and method of inspecting surface of workpiece
March 6, 2015. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesDefect detection system Technique for inspecting semiconductor wafers for particulate contamination System for detecting defects on an optical surface System for checking defects on a flat surface of an object Laser pattern generating system Compact laser scanning system Semiconductor wafer surface inspection apparatus and method Method and apparatus for inspecting reticles Apparatus with four light detectors for checking surface of mask with pellicle Particle detection on patterned wafers and the like InventorsAssigneeApplicationNo. 399962 filed on 03/06/1995US Classes:356/237.2, Surface condition356/343Using plural photocellsExaminersPrimary: Rosenberger, Richard A.Attorney, Agent or FirmForeign Patent References
International ClassG01N 021/88AbstractA surface inspection system and methods of inspecting a surface of a workpiece are provided for detecting particles, defects, or other surface characteristics in or on a surface of the workpiece. The surface inspection system preferably has a transporter arranged for transporting a workpiece along a material path and a rotator associated with the transporter and arranged for rotating a workpiece during translational travel along the material path. A scanner is positioned and arranged for scanning a surface of a workpiece during rotational and translational travel along the material path. The scanner preferably includes a light source arranged to generate a light beam therefrom and a deflector positioned to receive the light beam and arranged for deflecting the light beam along a predetermined scan path across a surface of the workpiece as the workpiece rotationally and translationally travels along the material path. A collector also is preferably arranged for collecting light specularly reflected and scattered from the surface of the workpiece during rotational and translational travel along the material path.Other References
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