Ultrasonic probe with back and forth sweeping ultrasonic source
Patent 5701901 Issued on December 30, 1997. Estimated Expiration Date: November 26, 2016. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
An ultrasonic probe for imaging tissues from inside a patient's body cavity is disclosed. The ultrasonic probe includes an end portion having a back and forth pivotable transducer assembly for transmitting an ultrasonic beam. The transducer assembly is supported by a silicon-containing support about a cavity and includes a transducer block on a base layer connected to the support via one or more twistable or flexible support arms. The transducer block includes a backing layer, a transducer layer on said backing layer, and an acoustic matching layer on the transducer layer. A bottom electrode in the transducer block penetrates the backing layer to connect electrically to a bottom face of the transducer layer to a conductor which is on a first face of the block. A top electrode penetrates the acoustic matching layer to connect electrically to a top face of the transducer layer to a conductor on a second face of the block for activating the transducer layer. The end portion also has an electromagnetic driver located near to the transducer assembly for acting on ferromagnetic material on the transducer assembly to result in pivotal motion of the transducer on the support arms.
Other References
Judy, et al., "Batch-Fabricated, Addressable, Magnetically Actuated Microstructures", Jun. 2-6, 1996, Solid-State Sensor and Actuator Workshop, Hilton Head, SC, pp. 187-190
Tabata, O., "PH-Controlled TMAH Etchants For Silicon Micromachining", 1996, Sensors and Actuators A, 53, pp. 335-339
Judy, et al., "Magnetic Microactuation of Polysilicon Flexure Structures", Dec. 1995, J. Microelecromech. Sys., vol. 4, No. 4, pp. 162-169
Judy, et al., "Fabrication Processes For Magnetic Microactuators With Polysilicon Flextures", Oct. 8-13, 1995, 4th International Symposium on Magnetic Materials, Processes and Devices, Chicago, IL, 2-page paper
Judy, et al., "Magnetic Microactuation of Torsional Polysilicon Structures", Jun. 25-29, 1995, 8th International Conference on Solid-State Sensors and Actuators, Stockholm, Sweden, pp. 332-335
Liu, et al., "A Micromachined Permalloy Magnetic Actuator Array for Micro Robotics Assembly Systems", Jun. 25-29, 1995, 8th International Conference on Solid-State Sensors and Actuators, and Eurosensors IX, Stockholm, Sweden, pp. 328-331
Liu, et al., "Out-of-Plane Permalloy Magnetic Actuators for Delta-Wing Control", Jan. 29-Feb. 3, 1995, Proc. IEEE Micro Electro Mechanical Systems, Amsterdam, The Netherlands, pp. 7-12
Garabedian, et al., "Microfabricated Surface Plasmon Sensing System", 1994, Sensors and Actuators A, 43, pp. 202-207
Guckel, et al., "A First Functional Current Excited Planar Rotational Magnetic Micromotor", Feb. 7-10, 1993, Proc. IEEE Micro Electro Mechanical Systems, Fort Lauderdale, FL., pp. 7-11
Ahn, et al., "A Planar Variable Reluctance Magnetic Micromotor With Fully Integrated Stator and Wrapped Coils", Feb. 7-10, 1993, Proc. IEEE Micro Electro Mechanical Systems, Fort Lauderdale, FL., pp. 1-6
Richards, et al., "Surface-Plasmon Excitation Using a Polarization-Preserving Optical Fiber and an Index-Matching Fluid Optical Cell", Jun. 1, 1993, Applied Optics, vol. 32, No. 16, pp. 2901-2906
Wagner, et al., "Microactuators With Moving Magnets For Linear, Torsional or Multiaxial Motion", 1992, Sensors and Actuators A, 32, pp. 598-603
Pister, et al., "Microfabricated Hinges", Sensors and Actuators A, 1992, 33, pp. 249-256
Ahn, et al., "A Fully Integrated Micromagnetic Actuator With a Multilevel Meander Magnetic Core", 1992, IEEE, 0-7803-0456-X/92, pp. 14-18
Wagner, et al., "Microfabricated Actuator With Moving Permanent Magnet", 1991, IEEE, CH2957-9/91/0000-0027, pp. 27-32
Tang, et al., "Electrostatic-Comb Drive of Lateral Polysilicon Resonators", Sensors and Actuators, 1990, A21-A23, pp. 328-331
Steinbruchel, et al., "Mechanism of Dry Etching of Silicon Dioxide", J. Electrochem. Soc.: Solid-State Science and Technology, Jan. 1985, vol. 132, No. 1, pp. 180-186
Sopori, "A New Defect Etch For Polycrystalline Silicon", Mar. 1984, J. Electrochem. Soc: Solid-State Science and Technology, vol. 131, No. 3, pp. 667-672
Bergeron, et al., "Controlled Antisoptropic Etching of Polysilicon", Aug. 1982, Solid State Technology, pp. 98-103
Mandurah, et al., "A Model for Conduction In Polycrystalline Silicon--Part 1: Theory", Oct. 1981, IEEE Transactions on Electron Devices, vol. ED-28, No. 10, pp. 1163-1170
Bean, "Antisotropic Etching of Silicon", IEEE Transactions on Electron Devices, Oct. 1978, vol. ED-25, No. 10, pp. 1185-1193
Declercq, "A New C-MOS Technology Using Antisotropic Etching of Silicon", Aug. 1975, IEEE J. Solid-State Cir., vol. SC-10, No. 4, pp. 191-196
Tenney, et al., "Etch Rates of Doped Oxides in Solutions of Buffered HF", Aug. 1973, J. Electrochem. Soc.: Solid-State Science and Technology, vol. 120, No. 8, pp. 1091-1095
Kamins, et al., "Diffusion of Impurities in Polycrystalline Silicon", Jan. 1972, J. Appl. Phys., vol. 43, No. 1, pp. 83-91
van Gelder, et al., "The Etching of Silicon Nitride in Phosphoric Acid with Silicon Dioxide As a Mask", Aug. 1967, J. Electrochem. Soc.: Solid-State Science, vol. 114, No. 8, pp. 869-872
Robbins, et al., "Chemical Etching of Silicon", Feb. 1960, J. Electrochem Soc., vol. 107, No. 2, pp. 108-11
November 26, 2016. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
