Pellicle for protection of photolithographic mask
Patent 5691088 Issued on November 25, 1997. Estimated Expiration Date: 
November 25, 2014. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
November 25, 2014. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesPellicle Releasing silicone composition and cured matter thereof Patent #: 5095085 InventorsAssigneeApplicationNo. 949389 filed on 09/22/1992US Classes:430/5, Radiation mask428/45, With frame, casing, or perimeter structure428/343, Adhesive outermost layer428/355RAdhesive compositionsExaminersPrimary: Chapman, MarkAttorney, Agent or FirmInternational ClassG03F 009/00Foreign Application Priority Data1991-09-26 JPAbstractDisclosed is a frame-supported pellicle for dust-proofing of a photolithographic photomask used for patteriwse light exposure in the manufacturing process of, for example, semiconductor devices, which comprises (a) a frame member, (b) a transparent polymeric film supported by the frame member and (c) a coating layer of a sticky adhesive on one surface of the polymeric film to capture any dust particles in the space between the photomask and the pellicle. The inventive pellicle is imparted with a greatly improved serviceable life with stability against ultraviolet irradiation relative to the adhesive coating layer which is formed from a specific organo-polysiloxane-based adhesive composition. |
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