Filtering technique for CVD chamber process gases
Patent 5681613 Issued on October 28, 1997. Estimated Expiration Date: 
February 17, 2015. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
February 17, 2015. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 1455116 3493431 Vapor delivery system and method Amorphous semiconductors equivalent to crystalline semiconductors produced by a glow discharge process Structure for filtering CVD chamber process gases Patent #: 5123375 InventorAssigneeApplicationNo. 390329 filed on 02/17/1995US Classes:427/248.1, COATING BY VAPOR, GAS, OR SMOKE95/287, In series257/E21.165, Conductive layer comprising silicide (EPO)257/E21.17, By chemical means, e.g., CVD, LPCVD, PECVD, laser CVD (EPO)257/E21.171, Selective deposition (EPO)257/E21.584, Barrier, adhesion or liner layer (EPO)257/E21.586, By selective deposition of conductive material in vias, e.g., selective chemical vapor deposition on semiconductor material, plating (EPO)427/255.28, Coating formed from vaporous or gaseous phase reaction mixture (e.g., chemical vapor deposition, CVD, etc.)427/255.392, Tungsten compound containing coating (e.g., tungsten silicide, etc.)427/444PRETREATMENT, PER SE, OR POST-TREATMENT, PER SE (WITHOUT CLAIMED COATING)ExaminersPrimary: Beck, ShriveAssistant: Meeks, Timothy Attorney, Agent or FirmInternational ClassC23C 016/02AbstractA method for filtering process gases prior to said process gases being allowed to enter a CVD chamber is provided in order to ensure high purity of the process gases. In one embodiment, the process gases are filtered with a first filter located in a first section of a gas line being isolated by valves at both ends of the gas line section. Further filtering by a second filter occurs in a downstream gas line section. | |
