Vapor delivery system for solid precursors and method regarding same
May 20, 2016. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesParaformaldehyde gas generator for fumigating animal houses Laser fired steam boiler Vaporizer system for ion source Method for controlling evaporation for vapor deposition Evaporation system and method for gas jet deposition of thin film materials Reductive elimination chemical vapor deposition processes utilizing organometallic precursor compounds in semiconductor wafer processing Method and apparatus for removing material from a target by use of a ring-shaped elliptical laser beam and depositing the material onto a substrate MOCVD system for forming superconducting thin films Gas feeding device for controlled vaporization of an organometallic compound used in deposition film formation Apparatus and method of manufacturing semiconductor device Patent #: 5529634 InventorsApplicationNo. 650743 filed on 05/20/1996US Classes:427/561, Pretreatment of coating supply or source outside of primary deposition zone or off site118/719, Multizone chamber118/726, Crucible or evaporator structure392/391, By radiant heat source427/248.1, COATING BY VAPOR, GAS, OR SMOKE427/595, Electromagnetic or particulate radiation utilized (e.g., IR, UV, X-ray, gamma ray, actinic, microwave, radio wave, atomic particle; i.e., alpha ray, beta ray, electron, etc.)427/596Laser or electron beam (e.g., heat source, etc.)ExaminersPrimary: Bueker, RichardAttorney, Agent or FirmInternational ClassC23C 016/00AbstractA vapor delivery system for vaporization and delivery of a solid precursor includes a housing having an inlet for receiving a carrier gas. A rotatable substrate surface is contained in the housing having a solid precursor material applied thereon. A focused thermal beam is positioned for impingement on the solid precursor material. A drive mechanism moves one of the rotatable surface and the focused thermal beam relative to the other such that with rotation of the rotatable substrate surface the focused thermal beam continuously impinges on a different contact area of the solid precursor material for vaporization thereof. The housing further has an outlet for transport of the vaporized precursor material therefrom. The rotatable surface may be a cylindrical surface or a circular platen surface. A CVD system having a vapor delivery system is also provided along with a device for use in the delivery system. A method for delivering the vaporized solid precursor to a CVD process chamber includes providing a surface having a solid precursor material applied thereon. A focused thermal beam is directed at the surface. The surface is rotated and one of the rotating surface and the focused thermal beam are indexed relative to the other such that the directed beam is repetitively moved from impinging upon one path of solid precursor material to a next path of solid precursor material to vaporize the solid precursor material on the surface. The vaporized solid precursor material is then transported to the process chamber.Field of SearchCrucible or evaporator structureMultizone chamber By radiant heat source Pretreatment of coating supply or source outside of primary deposition zone or off site Electromagnetic or particulate radiation utilized (e.g., IR, UV, X-ray, gamma ray, actinic, microwave, radio wave, atomic particle; i.e., alpha ray, beta ray, electron, etc.) Laser or electron beam (e.g., heat source, etc.) COATING BY VAPOR, GAS, OR SMOKE | |
