Abstract

A method of correcting a temperature probe reading in a thermal processing chamber for heating a substrate, including the steps of heating the substrate to a process temperature; using a first probe and a second probe to measure the temperature of the substrate, the first probe having a first effective reflectivity and the second chamber having a second effective reflectivity, the first probe producing a first temperature indication and the second probe producing a second temperature indication, and wherein the first and second effective reflectivities are different; and from the first and second temperature indications, deriving a corrected temperature reading for the first probe, wherein the corrected temperature reading is a more accurate indicator of an actual temperature of the substrate than are uncorrected readings produced by both the first and second probes.

Other References

• Deardorff, "Elimination of reflection errors in emissometers by using alternate apertures," Rev. Sci. Instrum., vol. 47 No. 10:1279-1282 (Oct. 1976)
• Doering, "Microelectronics Manufacturing Science and Technology Program Extends Capabilities in Integrated--Circuit Manufacturing", Microelectronics Manufacturing Science & Technology, 2-64 (1994)
• Apte et al., "Rapid Thermal Processing Uniformity Using Multivariable Control of a Circularly Symmetric 3 Zone Lamp", IEEE Transactions on Semiconductor Manufacturing, 5, 180-188 (1992)
• Roozeboom, "Manufacturing Equipment Issues in Rapid Thermal Processing", Rapid Thermal Processing Science and Technology 349-423 (1993)
• Pikashov et al., "Determining Emissivity And True Surface Temperature By Means Of A Pyrometer And An Attachment", Gas Institute, Kiev., translated from Inzhenerno-Fizicheskii Zhurnal, 16, 723-730 (1969)
• Roozeboom, "Rapid Thermal Processing; Status, Problems and Options After the First 25 Years", Mat.Res. Soc. Symp.Proc. 303, 149-164 (1993)
• Gyurcsik, et al., "A Model For Rapid Thermal Processing: Achieving Uniformity Through Lamp Control", IEEE Transactions on Semiconductor Manufacturing, 4, 9-13 (1991)
• Sorrell et al., "Temperature Uniformity in RTP Furances", IEEE Transactions on Electron Devices 39, 75-80 (1992)
• A. Honda et al., "New Radiation Thermometry Using Multiple Reflection For Temperature Measurement of Steel Sheets", American Institute of Physics 923-927
• A. Gouffe, Revue D'optique 24, 1-10 (1945) with translation
• Dilhac et al., "Temperature Control in a Rapid Thermal Processor", IEEE Transactions on Electron Devices, 39 201-203 (1992)
• Norman, "Optimization of Transient Temperature Uniformity in RIP Systems", IEEE Transactions On Electron Devices 39, 205-207 (1992