Optical scanning system utilizing an atomic force microscope and an optical microscope
Patent 5650614 Issued on July 22, 1997. Estimated Expiration Date: 
November 29, 2015. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
November 29, 2015. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 5117110 Dark field imaging defect inspection system for repetitive pattern integrated circuits Atomic probe microscope Optically guided macroscopic-scan-range/nanometer resolution probing system Scanning probe microscope Patent #: 5496999 InventorsAssigneeApplicationNo. 564747 filed on 11/29/1995US Classes:250/234, Means for moving optical system250/306INSPECTION OF SOLIDS OR LIQUIDS BY CHARGED PARTICLESExaminersPrimary: Westin, Edward P.Assistant: Pyo, Kevin Attorney, Agent or FirmForeign Patent References
International ClassG01B 007/34Foreign Application Priority Data1994-11-29 JPAbstractA light-scattering optical system is incorporated in an AFM instrument for a large sample. The instrument is equipped with an optical microscope. Incident light is introduced into the optical microscope to provide a dark field. The incident angle to the surface of a sample is made variable. The incident light is introduced into the main enclosure of the AFM through two optical fibers. Light reflected from the surface of the sample is received by a detector split into two parts. The dark field microscope is automatically brought to focus in response to signals from the detector. The whole apparatus is enclosed in a sound-insulating dark box to enhance the S/N during detection of scattered light. | |
