Apparatus for cleaning substrates and methods for attaching/detaching and cleaning brushes of such apparatus
Patent 5647083 Issued on July 15, 1997. Estimated Expiration Date: 
June 28, 2015. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
June 28, 2015. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesCleaning apparatus having a contact buffer apparatus Device having brush for scrubbing substrate Substrate treating apparatus Patent #: 5485644 InventorsAssigneeApplicationNo. 495216 filed on 06/28/1995US Classes:15/77, Sheet, bar, and plate cleaners15/21.1, Brushing15/88.2Work moves past rotatable brushExaminersPrimary: Scherbel, David A.Assistant: Chin, Randall E. Attorney, Agent or FirmForeign Patent References
International ClassA46B 013/02Foreign Application Priority Data1994-06-30 JPAbstractA plurality of brush support arms, each having a distal end unit brush attached thereto, stand by in juxtaposition in a standby position. The brush support arm having a desired brush attached thereto is selected from the plurality of brush support arms. Then, the selected brush support arm is connected at its proximal end to a distal end of a swing arm. The brush support arm engaged with the swing arm is swung with the swing arm about a pivotal point at a proximal end of the swing arm. As a result, the brush attached to the distal end of the selected brush support arm is moved between the standby position and the center of a substrate, to clean the substrate with this brush. Upon completion of this substrate cleaning, the brush support arm is returned to the standby position. A different brush support arm is selected in the standby position for use in a subsequent cleaning operation, and the substrate is cleaned with the brush connected to this different brush support arm. | |
