U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Image projection method and semiconductor device manufacturing method using the same

Patent 5631773 Issued on May 20, 1997. Estimated Expiration Date: Icon_subject June 7, 2015. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

3771872

3795446

3887816

Method of eliminating errors in images derived from patterns which consist of periodically arranged individual images
Patent #: 4159164
Issued on: 06/26/1979
Inventor: Dammann ,   et al.

Light illumination device
Patent #: 4497015
Issued on: 01/29/1985
Inventor: Konno ,   et al.

Exposure apparatus
Patent #: 4521082
Issued on: 06/04/1985
Inventor: Suzuki ,   et al.

Holographic method for producing desired wavefront transformations
Patent #: 4547037
Issued on: 10/15/1985
Inventor: Case

Optical apparatus using polarized light
Patent #: 4634240
Issued on: 01/06/1987
Inventor: Suzuki ,   et al.

Observation apparatus with selective light diffusion
Patent #: 4645924
Issued on: 02/24/1987
Inventor: Suzuki ,   et al.

Projection optical apparatus
Patent #: 4668077
Issued on: 05/26/1987
Inventor: Tanaka

More ...

Inventor

Assignee

Application

No. 483866 filed on 06/07/1995

US Classes:

359/562, For changing zeroth order intensity355/53, Step and repeat355/67, Illumination systems or details359/558, DIFFRACTION359/619By surface composed of lenticular elements

Examiners

Primary: Dzierzynski, Paul M.
Assistant: Chang, Audrey

Attorney, Agent or Firm

Foreign Patent References

  • 0293643 EP. 12/22/1988
  • 0346844 EP. 12/22/1989
  • 0437376 EP. 07/22/1991
  • 0486316 EP. 05/22/1992
  • 1579159 FR. 07/22/1969
  • 2835363 DE. 03/22/1980
  • 3933308 DE. 05/22/1990
  • 6262052 JP. 04/22/1982
  • 61-210627 JP. 09/22/1986
  • 1227151 GB. 04/22/1971

International Classes

G02B 005/18
G02B 027/46
G03B 027/42
G03B 027/54

Foreign Application Priority Data

1991-08-02 JP

Abstract

An edge emphasis type phase shift reticle is illuminated obliquely, and zeroth order diffraction light and first order diffraction light caused by a fine pattern of the reticle and having substantially the same intensity are incident and distributed on a pupil of a projection optical system, symmetrically with respect to a predetermined axis, whereby the fine pattern is imaged with use of the zeroth order diffraction light and first order diffraction light.

Other References

  • Fukuda, et al., "Nikkei Microdevices", pp. 108 through 114, Jul. 199
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