UV/EB curable butyl copolymers for lithographic and corrosion-resistant coating applications
Patent 5591551 Issued on January 7, 1997. Estimated Expiration Date: 
June 7, 2015. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
June 7, 2015. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 3002003 3096311 3100702 X-ray mask and a manufacture method therefor Process for manufacturing a photomask Patent #: 4876164 InventorsAssigneeApplicationNo. 474870 filed on 06/07/1995US Classes:430/18Including resin or synthetic polymerExaminersPrimary: Lesmes, George F.Assistant: Codd, Bernard Attorney, Agent or FirmInternational ClassG03C 003/00AbstractA lithographic coating and method of framing a lithographic image are disclosed. The method comprises coating at least a portion of a surface of an article with a radiation-crosslinkable polymer, and exposing the coated surface to a pattern of radiation to crosslink the polymer in a lithographic image. The functionalized polymer is a copolymer of an isoolefin of 4 to 7 carbon atoms and para-alkylstyrene, wherein the para-alkylstyrene is functionalized with a radiation reactive group at the para-alkyl group of the para-alkylstyrene.Field of SearchIncluding resin or synthetic polymerPolymeric diazonium compound Polymeric quinone diazide Polymeric azide Radiation sensitive composition or product or process of making Radiation sensitive composition comprising ethylenically unsaturated compound Resin or prepolymer containing ethylenical unsaturation Ethylenic unsaturation within the side chain component Electron beam imaging Making printing plates Including etching substrate Post image treatment to produce elevated pattern Removal of imaged layers Binder containing Initiator containing Redox or dye sensitizer Free radical |
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