Rapid thermal processing apparatus and method
August 30, 2014. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 3213827 High intensity radiation source Method of activating implanted ions by incoherent light beam Method for annealing semiconductors with a planar source composed of flash discharge lamps Light-radiant furnace for heating semiconductor wafers Cooled optical window for semiconductor wafer heating Apparatus for heating semiconductor wafers in order to achieve annealing, silicide formation, reflow of glass passivation layers, etc. High intensity radiation apparatus having vortex restriction means Semiconductor wafer heating chamber Apparatus for thermal treatments of thin parts such as silicon wafers InventorAssigneeApplicationNo. 298163 filed on 08/30/1994US Classes:392/416, With chamber118/725, Substrate heater219/405, Including heat energy reflecting or directing means219/411, With infrared generating means392/424Heating element in transparent tubular envelopeExaminersPrimary: Walberg, TeresaAssistant: Pelham, J. Attorney, Agent or FirmForeign Patent References
International ClassesF37B 005/14F27D 011/02 H01L 021/324 AbstractAn apparatus and method for rapidly and uniformly heating a workpiece includes a plurality of walls defining a first chamber, a first source of radiation for producing incident radiation on a first energy transfer surface of the workpiece, a holder for holding the workpiece in a workpiece plane in the chamber and a radiation absorbing surface on at least one wall of the chamber. The holder has an energy transfer surface, the energy transfer surfaces of the holder and of the workpiece reflecting and emitting radiation in the chamber and the radiation absorbing surface particularly for absorbing radiation reflected and radiation emitted from the energy transfer surfaces.Other References
Field of SearchWith chamberWith support for workpiece Elongated reflector Heating element in transparent tubular envelope Muffle-type enclosure Including heat energy reflecting or directing means With infrared generating means With means whereby material to be heated may be passed continuously through heated area (e.g., conveyor) By means to heat or cool Substrate heater With means to apply electrical and/or radiant energy to work and/or coating material | |
