U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Unit magnification projection system and method

Patent 5559629 Issued on September 24, 1996. Estimated Expiration Date: Icon_subject November 30, 2014. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

Optical projection and scanning apparatus
Patent #: 4068947
Issued on: 01/17/1978
Inventor: Buckley ,   et al.

Unit-power concentric optical systems
Patent #: 4103989
Issued on: 08/01/1978
Inventor: Rosin

Compact image projection apparatus
Patent #: 4171870
Issued on: 10/23/1979
Inventor: Bruning ,   et al.

Achromatic unit magnification optical system
Patent #: 4171871
Issued on: 10/23/1979
Inventor: Dill ,   et al.

Beam-splitting optical system
Patent #: 4288148
Issued on: 09/08/1981
Inventor: Offner ,   et al.

Restricted off-axis field optical system
Patent #: 4293186
Issued on: 10/06/1981
Inventor: Offner

Photolithographic projection apparatus using light in the far ultraviolet
Patent #: 4302079
Issued on: 11/24/1981
Inventor: White

Apparatus for projecting a series of images onto dies of a semiconductor wafer
Patent #: 4425037
Issued on: 01/10/1984
Inventor: Hershel ,   et al.

Step-and-repeat alignment and exposure system
Patent #: 4585337
Issued on: 04/29/1986
Inventor: Phillips

Method and apparatus for optical system adjustments
Patent #: 4693569
Issued on: 09/15/1987
Inventor: Offner

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Inventors

Assignee

Application

No. 347818 filed on 11/30/1994

US Classes:

359/364, With curved reflective imaging element355/53, Step and repeat359/650, Having four components359/720, Asymmetric (e.g., prismatic or eccentric, etc.)359/727, Including concave or convex reflecting surface359/737, With diverse refracting element359/900METHODS

Examiners

Primary: Dzierzynski, Paul M.
Assistant: Juba, John Jr.

Attorney, Agent or Firm

International Class

G02B 017/00

Abstract

A Dyson lens system includes a radiation source, a concave mirror, and a plano-convex lens. There is also incorporated in the system an additional lens that is spaced from the plano-convex lens a large part of the distance from the plano-convex lens to the mirror. A roof prism and a turning prism are provided to conduct radiation from the radiation source to the plano-convex lens and also from the plano-convex lens to an image plane. An image adjustor or compensator is provided between the prisms and either the image plane or an object plane--the latter being disposed between the radiation source and the prisms. An adjustment mechanism is provided to effect highly accurate adjustment of the location of the image, the adjustment mechanism including physical shifting to a slight degree of a portion of one or both prisms.

Other References

  • J. Dyson; "Unit Magnification Optical System without Seidel Aberrations"; Journal of the Optical Society of America, vol. 49, No. 7, Jul., 1959; pp. 713-716
  • Douglas S. Goodman of IBM, T. J. Watson Research Center, Yorktown, New York; "Scanning Excimer Ablation System"; Optical Society of America Annual Meeting in San Jose, California, Nov. 6, 199
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