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US Patent 5523266 - Optical member of synthetic quartz glass for excimer lasers and method for producing same
US Patent Issued on June 4, 1996
Estimated Patent Expiration Date:
August 5, 2014Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
Estimated Patent Expiration Date:
August 5, 2014Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.AbstractA synthetic quartz glass optical member for an ultraviolet laser, where the quartz glass has a hydroxyl content of 10-100 ppm, a chlorine content of 200 ppm or less, a hydrogen content of 1×1016 molecules/cm3 or less, a homogeneity of refractive index of 5×10-6 or less in terms of Ɗn, and a birefringence of 5 nm/cm or less.Other References
| InventorsAssigneeApplicationNo. 286538 filed on 08/05/1994US Classes:501/54, More than 90 percent by weight silica501/900OPTICAL GLASS (E.G., SILENT ON REFRACTIVE INDEX AND/OR ABBE NUMBER)Field of Search501/54, More than 90 percent by weight silica501/900OPTICAL GLASS (E.G., SILENT ON REFRACTIVE INDEX AND/OR ABBE NUMBER)ExaminersPrimary: Bonner, MelissaAttorney, Agent or FirmUS Patent References4162908, Method of producing synthetic quartz glass, apparatus for the practice of the method, and use of the synthetic quartz glassIssued on: 07/31/1979 Inventor: Rau , et al.4317668, Method for producing silica glass Issued on: 03/02/1982 Inventor: Susa , et al.5349456, Substrate having an active element array with low hydroxyl and chlorine Issued on: 09/20/1994 Inventor: Iwanaga, et al.5364433Optical member of synthetic quartz glass for excimer lasers and method for producing same Issued on: 11/15/1994 Inventor: Nishimura, et al. Foreign Patent References
International ClassesC03B 020/00C03C 003/06 Foreign Application Priority Data1991-06-29 JP |
