Optical member of synthetic quartz glass for excimer lasers and method for producing same
Patent 5523266 Issued on June 4, 1996. Estimated Expiration Date: 
August 5, 2014. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
August 5, 2014. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesMethod of producing synthetic quartz glass, apparatus for the practice of the method, and use of the synthetic quartz glass Method for producing silica glass Substrate having an active element array with low hydroxyl and chlorine Optical member of synthetic quartz glass for excimer lasers and method for producing same Patent #: 5364433 InventorsAssigneeApplicationNo. 286538 filed on 08/05/1994US Classes:501/54, More than 90 percent by weight silica501/900OPTICAL GLASS (E.G., SILENT ON REFRACTIVE INDEX AND/OR ABBE NUMBER)ExaminersPrimary: Bonner, MelissaAttorney, Agent or FirmForeign Patent References
International ClassesC03B 020/00C03C 003/06 Foreign Application Priority Data1991-06-29 JPAbstractA synthetic quartz glass optical member for an ultraviolet laser, where the quartz glass has a hydroxyl content of 10-100 ppm, a chlorine content of 200 ppm or less, a hydrogen content of 1×1016 molecules/cm3 or less, a homogeneity of refractive index of 5×10-6 or less in terms of Ɗn, and a birefringence of 5 nm/cm or less.Other References
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