U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Gas handling device assembly used for a CVD apparatus

Patent 5488925 Issued on February 6, 1996. Estimated Expiration Date: Icon_subject August 11, 2014. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

3654960

3665961

3698432

3756274

Fluid pressure-operated systems
Patent #: 4183373
Issued on: 01/15/1980
Inventor: Kay

Gas control system for chemical vapor deposition system
Patent #: 4369031
Issued on: 01/18/1983
Inventor: Goldman ,   et al.

Mounting plate storing conductor function
Patent #: 5025834
Issued on: 06/25/1991
Inventor: Stoll

Photo-CVD system
Patent #: 5215588
Issued on: 06/01/1993
Inventor: Rhieu

Chemical vapor growth apparatus having an exhaust device including trap
Patent #: 5250323
Issued on: 10/05/1993
Inventor: Miyazaki

Integrated delivery system for chemical vapor from non-gaseous sources for semiconductor processing
Patent #: 5252134
Issued on: 10/12/1993
Inventor: Stauffer

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Inventor

Application

No. 288926 filed on 08/11/1994

US Classes:

118/715, GAS OR VAPOR DEPOSITION137/884Sectional block structure

Examiners

Primary: Breneman, R. Bruce
Assistant: Lund, Jeffrie R.

Attorney, Agent or Firm

Foreign Patent References

  • 152121 JP 07/13/1987

International Class

C23C 016/00

Foreign Application Priority Data

1993-10-28 JP

Abstract

There is provided a gas handling device assembly of which one of gas handling devices can be removed from the gas handling device assembly without loosening other component devices. The gas handling device assembly has a base plate having a top surface and a bottom surface opposite to the top surface. A plurality of through holes extending from the top surface to the bottom surface are formed in the base plate so that the gas flows through the through holes. There is provided a gas-handling device having a mount surface via which the gas-handling device is fixed to the base plate, an inlet port and an outlet port for the gas being formed on the mount surface so that each of the inlet port and the outlet port is connected to one of through holes of the base plate. There is also provided a connecting tube having a first connecting member on one end and a second connecting member on the other end, the first connecting member and the second connecting member facing toward the same direction. The gas handling device is fixed to the top surface of the base plate, and the connecting tube is fixed to the bottom surface of the base plate so that the gas handling device, the through holes, and the connecting tube, together form a predetermined gas-flow circuit.

Other References

  • Hydraulics & Pneumatics, What Can You Get In Manifolds vol. 16 No. 11 Nov. 63 pp. 88-8
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