Patent References 3654960 3665961 3698432 3756274 Fluid pressure-operated systems Gas control system for chemical vapor deposition system Mounting plate storing conductor function Photo-CVD system Chemical vapor growth apparatus having an exhaust device including trap Integrated delivery system for chemical vapor from non-gaseous sources for semiconductor processing InventorApplicationNo. 288926 filed on 08/11/1994US Classes:118/715, GAS OR VAPOR DEPOSITION137/884Sectional block structureExaminersPrimary: Breneman, R. BruceAssistant: Lund, Jeffrie R. Attorney, Agent or FirmForeign Patent References
International ClassC23C 016/00Foreign Application Priority Data1993-10-28 JPAbstractThere is provided a gas handling device assembly of which one of gas handling devices can be removed from the gas handling device assembly without loosening other component devices. The gas handling device assembly has a base plate having a top surface and a bottom surface opposite to the top surface. A plurality of through holes extending from the top surface to the bottom surface are formed in the base plate so that the gas flows through the through holes. There is provided a gas-handling device having a mount surface via which the gas-handling device is fixed to the base plate, an inlet port and an outlet port for the gas being formed on the mount surface so that each of the inlet port and the outlet port is connected to one of through holes of the base plate. There is also provided a connecting tube having a first connecting member on one end and a second connecting member on the other end, the first connecting member and the second connecting member facing toward the same direction. The gas handling device is fixed to the top surface of the base plate, and the connecting tube is fixed to the bottom surface of the base plate so that the gas handling device, the through holes, and the connecting tube, together form a predetermined gas-flow circuit.Other References
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