Arc assisted CVD coating method and apparatus
November 14, 2014. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesMagnetoplasmadynamic apparatus and process for the separation and deposition of materials Method of forming refractory metal conductors of low resistivity Semiconductor device manufacturing unit Magnetoplasmadynamic apparatus for the separation and deposition of materials Toilet for cats and other small animals Method and apparatus for uniformly heating articles in a vacuum container Magnetoplasmadynamic processor, applications thereof and methods Vapor nozzle with gas barrier bars Method of utilizing a plasma column Patent #: 4725447 InventorApplicationNo. 338844 filed on 11/14/1994US Classes:427/571, With magnetic enhancement118/50.1, With means to apply electrical and/or radiant energy to work and/or coating material118/500, WORK HOLDERS, OR HANDLING DEVICES118/623, Including electromagnetic field118/728, Work support427/577, Inorganic carbon containing coating material, not as steel (e.g., carbide, etc.)427/580, Electrical discharge (e.g., arcs, sparks, etc.)427/585, Chemical vapor deposition (e.g., electron beam or heating using IR, inductance, resistance, etc.)427/598Magnetic field or force utilizedExaminersPrimary: Pianalto, BernardAttorney, Agent or FirmForeign Patent References
International ClassB05D 003/06AbstractAn improved vacuum arc coating apparatus is provided, having a reaction zone with a plasma channel defined within a series of aligned annular substrate holders, or between an outer wall of a chain of substrate holder blocks and the inner wall of the tube. The substrate holders thus act as a liner, confining an arc within the plasma channel. Carrier and plasma creating gases and the reaction species are introduced into the tube, and the deposition process may be carried out at a pressure between 10 Torr and 1000 Torr. Magnetic coils may be used to create a longitudinal magnetic field which focuses the plasma column created by the arc, and to create a transverse magnetic field which is used to bias the plasma column toward the substrates. Substrates can thus be placed anywhere within the reaction zone, and the transverse magnetic field can be used to direct the plasma column toward the substrate, or the tube itself can be rotated to pass the substrate through the plasma column.Other References
Field of SearchWith magnetic enhancementElectrical discharge (e.g., arcs, sparks, etc.) Inorganic carbon containing coating material, not as steel (e.g., carbide, etc.) Chemical vapor deposition (e.g., electron beam or heating using IR, inductance, resistance, etc.) Magnetic field or force utilized With means to apply electrical and/or radiant energy to work and/or coating material Including electromagnetic field WORK HOLDERS, OR HANDLING DEVICES Work support | |
