Modular processing apparatus for processing semiconductor wafers
Emission microscopy system
Wafer alignment and positioning apparatus for chip testing by voltage contrast electron microscopy Patent #: 4772846
ApplicationNo. 174943 filed on 12/27/1993
US Classes:324/750, System sensing fields adjacent device under test (DUT)250/310, Electron probe type250/442.11, With object moving or positioning means324/751Using electron beam probe
ExaminersPrimary: Wieder, Kenneth A.
Assistant: Wardas, Mark
Attorney, Agent or Firm
International ClassC23C 014/00
AbstractAn emission microscope is mounted on a transportable structure for use on a test floor and encloses or garages an entire automatic test equipment head to facilitate high-speed testing. Test procedures allow development of static/fixed defects over time. A video mask can be developed based on emission sites on known good devices so that only emission from defect sites of bad devices under test are shown.