ApplicationNo. 257993 filed on 06/10/1994
US Classes:118/728, Work support269/8, MAGNETIC HOLDER361/234Pinning
ExaminersPrimary: Chaudhuri, Olik
Assistant: Dutton, Brian
Attorney, Agent or Firm
International ClassesC23C 016/00
AbstractA method and apparatus is provided for effectively releasing a semiconductor wafer (36) from a deactivated electrostatic clamp (20) by diffusing a neutralizing gas into the space between the clamping surface of the electrostatic clamp and the surface of the wafer, generating an ionizing voltage with an alternating polarity, and applying the alternating polarity ionizing voltage to the diffusing gas to neutralize the residual electrostatic charges remaining on the surfaces of the clamp (20) and the wafer (36).