Method and apparatus for improving semiconductor wafer surface temperature uniformity
February 18, 2014. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesHeater assembly for thermal processing of a semiconductor wafer in a vacuum chamber Heating system for substrates Method for rapidly thermally processing a semiconductor wafer by irradiation using semicircular or parabolic reflectors Apparatus and method for substrate heating utilizing various infrared means to achieve uniform intensity Conical rapid thermal processing apparatus Method of thermally processing semiconductor wafers and an apparatus therefor Patent #: 5259883 InventorApplicationNo. 198726 filed on 02/18/1994US Classes:359/350, HAVING SIGNIFICANT INFRARED OR ULTRAVIOLET PROPERTY219/405, Including heat energy reflecting or directing means219/411, With infrared generating means359/853Light concentrating (e.g., heliostat, etc.), concave, or paraboloidal structureExaminersPrimary: Lerner, MartinAttorney, Agent or FirmInternational ClassesG02B 005/10F27D 011/00 AbstractIn a processing chamber that includes a wafer pedestal adapted to heat and cool a wafer during wafer processing, where the wafer is secured to the pedestal with a wafer clamp ring, a yoke having a surface in spaced facing relation with a wafer surface is positioned atop the clamp ring proximate to the wafer. The yoke surface includes a concave circumferential portion that is curved to provide a reflector, for example a parabolic or elliptical reflector, that is positioned having a focal point coincident with the wafer edge. Reflector positioning and spacing relative to the wafer surface encourage reflection of heat radiated from the edge portion of the wafer surface back to the wafer edge to mitigate thermal losses at the wafer edge and improve temperature uniformity across the surface of the wafer.Other References
Field of SearchHAVING SIGNIFICANT INFRARED OR ULTRAVIOLET PROPERTYMultilayer filter or multilayer reflector Light concentrating (e.g., heliostat, etc.), concave, or paraboloidal structure Plural mirrors or reflecting surfaces Concave cylindrical or providing a line focus Including heat energy reflecting or directing means With infrared generating means | |
