Semiconductor wafer inspection apparatus
Patent 5465145 Issued on November 7, 1995. Estimated Expiration Date: 
September 20, 2014. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
September 20, 2014. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesLight collector for optical contaminant and flaw detector Patent #: 4601576 InventorsAssigneeApplicationNo. 309999 filed on 09/20/1994US Classes:356/237.5, On patterned or topographical surface (e.g., wafer, mask, circuit board)257/E21.53, For structural parameters, e.g., thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions (EPO)359/884With selective absorption or transparent overcoatingExaminersPrimary: McGraw, Vincent P.Attorney, Agent or FirmForeign Patent References
International ClassG01N 021/88Foreign Application Priority Data1993-10-18 JPAbstractDisclosed is a semiconductor wafer inspection apparatus which effectively prevents an erroneous identification of small pits as particles on a surface of a sample. In such a semiconductor wafer inspection apparatus, a light collecting portion and a reflection adjustment portion having a light reflectance different from a light reflectance of the light collecting portion are included in light collecting means.Other References
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