Methods of forming multiple phase light modulators
Method for fabricating microstructures Patent #: 5314572
ApplicationNo. 263208 filed on 06/21/1994
US Classes:216/66, Using ion beam, ultraviolet, or visible light216/2, ETCHING OF SEMICONDUCTOR MATERIAL TO PRODUCE AN ARTICLE HAVING A NONELECTRICAL FUNCTION430/323Including etching substrate
ExaminersPrimary: Powell, William A.
Attorney, Agent or Firm
International ClassesB44C 001/22
AbstractA method of fabricating micro-mechanical devices that use support elements (13) raised from a substrate (15), to support moveable elements (11). First, support elements (13) having reflective top surfaces (31) are fabricated. A layer of photoresist material (41) is then deposited over the support elements (13), to a thickness that substantially covers their reflective top surfaces (31). The photoresist layer (41) is exposed, which results in the areas (61) over the support elements (13) being more highly exposed than the areas (62) between the support elements (13). This permits a subsequent developing step that can be controlled to the purpose of removing the photoresist between the support elements (13) to a height planar with the reflective top surfaces of the support elements, while guaranteeing that the photoresist will be removed over the support elements (13).