Multi-zone lamp interference correction system

Patent 5444815 Issued on August 22, 1995. Estimated Expiration Date:

December 16, 2013. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Abstract Claims Description Full Text

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Inventors

Assignee

Texas Instruments Incorporated

Application

No. 168433 filed on 12/16/1993

US Classes:

392/416, With chamber118/724, By means to heat or cool374/126, Having emissivity compensating or specified radiating surface392/418With support for workpiece

Examiners

Primary: Jeffery, John A.

Attorney, Agent or Firm

Garner; Jacqueline J., Donaldson; Richard l., Hiller; William E.

Foreign Patent References

92/12405 WO. 07/13/1992

International Classes

H05B 003/62
H01L 021/00

Abstract

A multi-zone lamp interference correction system and method for accurate pyrometry-based multi-point wafer temperature measurement in a multi-zone rapid thermal processing system comprises a plurality of lamps arranged in zones. A dummy lamp is also provided for each zone. Each lamp heating zone and its associated dummy lamp are connected to a controllable power supply. The radiance from a particular zone in the wafer combined with the lamp interference associated with the zone is measured using a first plurality of sensors. The lamp radiation from the plurality of dummy lamps are monitored using a second plurality of sensors. For each zone, a lamp interference component is removed from the wafer temperature sensor signal. The lamp interference components are based on geometry factors and the lamp radiance signals.