U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Method for manufacturing ultraviolet microscope dry objectives and microscope objectives manufactured in accordance with this method

Patent 5440422 Issued on August 8, 1995. Estimated Expiration Date: Icon_subject June 14, 2013. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

3348896

Ultra-violet micrographic objective
Patent #: 4050778
Issued on: 09/27/1977
Inventor: Fleischman

Microscope objective with correcting means
Patent #: 4059342
Issued on: 11/22/1977
Inventor: Tojyo

Mapping lens
Patent #: 4832472
Issued on: 05/23/1989
Inventor: Robb

UV-capable dry lens for microscopes
Patent #: 5103341
Issued on: 04/07/1992
Inventor: Ulrich, et al.

Objective lens system for microscope
Patent #: 5121255
Issued on: 06/09/1992
Inventor: Hayashi

Objective lens system for use within microscope
Patent #: 5144475
Issued on: 09/01/1992
Inventor: Hayashi

Objective lens system for use within microscope Patent #: 5159492
Issued on: 10/27/1992
Inventor: Hayashi

Inventor

Assignee

Application

No. 076121 filed on 06/14/1993

US Classes:

359/355, Lens, lens system or component359/657Having seven components

Examiners

Primary: Lerner, Martin

Attorney, Agent or Firm

Foreign Patent References

  • 0269926A2 EP. 06/13/1988
  • 0284414A2 EP. 09/13/1988
  • 2602730A1 DE. 07/13/1976
  • 3915868 DE. 11/13/1990

International Classes

G02B 013/14
G02B 011/34

Foreign Application Priority Data

1992-06-12 DE

Abstract

A method for the manufacture of quasi-monochromatic microscope dry objectives for a wavelength range from 190 to 360 nanometers proceeds from a basic objective with a specified number of lenses. The basic objective is corrected for a specified wavelength with respect to image aberrations. By using lenses with slightly different production thicknesses and by arranging the lenses at different air separations, objectives for other areas of application are created. All of the objectives have the same number of lenses and virtually the same resolution. The data for three objectives derived from a basic objective are provided as an example.

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