U.S. patents available from 1976 to present.
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Optical heterodyne interference measuring apparatus and method, and exposing apparatus and device manufacturing method using the same, in which a phase difference between beat signals is detected

Patent 5432603 Issued on July 11, 1995. Estimated Expiration Date: Icon_subject November 17, 2013. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

Laser heterodyne surface profiler
Patent #: 4353650
Issued on: 10/12/1982
Inventor: Sommargren

Linear and angular displacement measuring interferometer
Patent #: 4859066
Issued on: 08/22/1989
Inventor: Sommargren

Method of alignment with the use of diffraction gratings and an apparatus therefor
Patent #: 5000573
Issued on: 03/19/1991
Inventor: Suzuki, et al.

An alignment system for align first and second objects using alignment marks
Patent #: 5028797
Issued on: 07/02/1991
Inventor: Abe, et al.

Positional deviation detecting method Patent #: 5225892
Issued on: 07/06/1993
Inventor: Matsugu, et al.

Inventors

Assignee

Application

No. 153038 filed on 11/17/1993

US Classes:

356/490Alignment

Examiners

Primary: Turner, Samuel A.
Assistant: Kim, Robert H.

Attorney, Agent or Firm

Foreign Patent References

  • 62-58628 JP. 03/25/1987
  • 3216530 JP 09/25/1991

International Class

G01B 009/02

Foreign Application Priority Data

1992-11-20 JP

Abstract

An optical element comprised of a plurality of polarizing beam splitters is provided on the optical path of a two-frequency linearly polarized laser beam source, and the optical element divides a light beam from the two-frequency linearly polarized laser beam source into two light beams, whereafter these two light beams are incident on diffraction gratings provided on a mask and a wafer, respectively. A pair of mirrors are provided vertically above the mask, and a pair of lenses, a pair of polarizing plates and a pair of photoelectric detectors are arranged in succession in the directions of reflection of the pair of mirrors. The outputs of the two photoelectric detectors become beat signals, and the phase difference between these beat signals is measured, whereby the alignment of the mask and wafer is effected. Since the optical element is comprised of a plurality of polarizing beam splitters, leak-in light included in each light beam is reduced.

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