U.S. patents available from 1976 to present.
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Method and apparatus for heat treating

Patent 5431561 Issued on July 11, 1995. Estimated Expiration Date: Icon_subject December 14, 2013. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

Apparatus for manufacturing semiconductor device
Patent #: 4802842
Issued on: 02/07/1989
Inventor: Hirayama

Heat-treating apparatus
Patent #: 4938691
Issued on: 07/03/1990
Inventor: Ohkase, et al.

Cage boat having removable slats
Patent #: 5054418
Issued on: 10/08/1991
Inventor: Thompson, et al.

Method of loading and unloading wafer boat
Patent #: 5055036
Issued on: 10/08/1991
Inventor: Asano, et al.

Vertical heat treatment apparatus Patent #: 5221201
Issued on: 06/22/1993
Inventor: Yamaga, et al.

Inventors

Assignee

Application

No. 166014 filed on 12/14/1993

US Classes:

432/253, ACCESSORY MEANS FOR HOLDING, SHIELDING OR SUPPORTING WORK WITHIN FURNACE432/152Having distinct atmosphere supply, removal or recirculation structure

Examiners

Primary: Dolinar, Andrew M.

Attorney, Agent or Firm

International Class

F27D 005/00

Foreign Application Priority Data

1990-11-30 JP

Abstract

A method and an apparatus for heat treating in a heat treating apparatus having a heating chamber to be introduced with predetermined gas, a heater disposed around the heating chamber, and jigs disposed in the heating chamber for supporting wafers of a plurality of substrates to be treated in parallel with each other, wherein in order to make the temperature distribution of the wafers of the substrates to be treated in the radial direction uniform in the heat treatment, the jigs are formed to determine the sizes and the shape thereof in predetermined ranges having a gradient according to the heat treating method having a predetermined shape determining procedure so that the jigs are formed in ring-shaped trays (i.e. support-ring) for holding at the peripheries the substrates to be treated and the thickness of the tray is constant or such that the outer peripheral side thereof is thicker than the inner peripheral side thereof.

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