Index interferometric instrument including both a broad band and narrow band source
Patent 5416587 Issued on May 16, 1995. Estimated Expiration Date: July 9, 2013. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
The Index Interferometric Instrument is a highly accurate instrument which can be utilized to measure the index of refraction, the dispersion, and the index profile of materials. The instrument provides the data necessary to measure the index of refraction of materials to five significant figures. The index profile can be measured at any chosen wavelength without any sample preparation. The instrument utilizes a 10 nm to a 400 nm bandwidth light source and a light source with a bandwidth of less than 10 nm in combination with an interferometer. Each light source creates interference patterns from the sample and a reference mirror which can be used to accurately calculate the index of refraction of an entire sample at any given point on the sample.
Other References
Diana Tentori and Carlos Lopez, "High-Accuracy Critical Angle Refractometry," Optical Engineering, Mar. 1993, pp. 593-601. Shows that there are methods to improve the accuracy of refractive measurements that use prisms
Diana Tentori, "High-Precision Refractometry by Hologram and Interferometry," Optical Engineering Apr. 1992, pp. 805-808. Explains a method for using interference patterns to measure the refractive index of an optical glass sample in the form a wedge by comparisons with a reference liquid
Diana Tentori and Jesus Lerma, "Refractometry by Minimum Deviation: Accuracy Analysis," Optical Engineering, Feb. 1992, pp. 160-168. Analyzes the accuracy achieved when evaluating high refractive indices by minimum deviation deflectometry
Metricon Model 2010 Prism Computer 1991, (advertisement) Describes a device utilizing a prism and a laser beam that can be directed at different angles to obtain an optical propagation mode that can be used to determine the index of refraction and thickness of thin film
Roger Johnston and W. Kevin Grace, "Refractive Index Detector Using Zeeman Interfermetry", Applied Optics, 1 Nov. 1990, pp. 4720-4724. Discusses the theory and error analysis for an ultrasensitive refractive index detector using a Zeeman effect laser
R. W. Ditchburn, Light, 1976, pp. 332-337. Describes measuring refractive index with interferometers
Alan Werner, "Methods in High Precision Refractometry of Optical Glasses," Applied Optics, May 1968, pp. 837-844. Describes five refractive methods and an interferomtric method for measuring refractive indices of optical glasses
H. G. Jerrard, "Sources of Error in Ellipsometry," Proceeding of the Symposium on Recent Developments in Ellipsometry, 1968, pp. 67-87. Describes sources of error in ellipsometry
G. E. Fishter, "Refractometry," Applied Optics and Optical Engineering (Kingslake), 1967, pp. 363-383. Background material on refractometry
O. S. Heavens, Optical Properties of Thin Films, 1965, pp. 4-5, 96-131. Explores various methods for measuring film thickness
Elio Passaglia, R. R. Stromberg, and J. Kruger eds., Ellipsometry in the Measurement of Thin Films, 1964, pp. 1, 34-39. Describes the optics of absorbing film on metal
Leroy Tilton, "Testing and Accurate Use of Abbe-Type Refractometers," Journal of the Optical Society of America, Jul. 1942, pp. 371-381. Background material on refractometer
H. W. Straat and J. W. Forrest, "The Accuracy Requirements in Fifth Place Refractometry," Jun. 1939, pp. 240-247. Background material on refractometers
Jacques Ludman and Juanita Riccobono, "Index Interferometer," 20-1 Jul. 1992, Reprint from Optical Information Processing Systems and Architecture, pp. 258-264. This is the inventors article. The present application was filed less than one year after the publication and the presentation that this publication was based upon. Therefore, the publication is no considered prior ar
July 9, 2013. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
