Rotating analyzer type ellipsometer
Film thickness-measuring apparatus
Method and apparatus for measuring thickness of thin films
Apparatus for analysis by ellipsometry, procedure for ellipsometric analysis of a sample and application to the measurement of variations in the thickness of thin films
High resolution ellipsometric apparatus
Optical measurement device with enhanced sensitivity
Simultaneous multiple angle/multiple wavelength ellipsometer and method
Method and apparatus for evaluating the thickness of thin films
ApplicationNo. 093178 filed on 07/16/1993
US Classes:356/451, Spectroscopy356/369, Of surface reflection356/457, Holography356/492, For dimensional measurement356/504, Refraction from surfaces of different refractive index356/632Of light permeable material
ExaminersPrimary: Turner, Samuel A.
Assistant: Eisenberg, Jason D.
Attorney, Agent or Firm
International ClassG01B 009/02
AbstractAn optical measurement device is disclosed for evaluating the parameters of a sample. The device includes a polychromatic source for generating a probe beam. The probe beam is focused on the sample surface. Individual rays within the reflected probe beam are simultaneously analyzed as a function of the position within the beam to provide information at multiple wavelengths. A filter, dispersion element and a two-dimensional photodetector array may be used so that the beam may be simultaneously analyzed at multiple angles of incidence and at multiple wavelengths. A variable image filter is also disclosed which allows a selection to be made as to the size of the area of the sample to be evaluated.