U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Multi-variable statistical process controller for discrete manufacturing

Patent 5408405 Issued on April 18, 1995. Estimated Expiration Date: Icon_subject September 20, 2013. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

3751647

Method and apparatus for quality measure driven process control Patent #: 5196997
Issued on: 03/23/1993
Inventor: Kurtzberg, et al.

Inventors

Assignee

Application

No. 124083 filed on 09/20/1993

US Classes:

700/31, Having adjustment of model (e.g., update)700/121, Integrated circuit production or semiconductor fabrication702/84Quality control

Examiners

Primary: Gordon, Paul P.

Attorney, Agent or Firm

International Classes

G06F 015/46
G05B 013/04

Abstract

A method and system for controlling a plurality of process control variables for processing discrete products is described. The method comprising: utilizing process models relating a plurality of product quality parameters to the plurality of process control variables; measuring the plurality of product quality parameters on a first plurality of products; exercising statistical quality control tests on the plurality of product quality parameters of the first plurality of products; continuing processing if statistical quality control tests are successful; otherwise measuring the plurality of product quality parameters on a second plurality of products; tuning the process models to create tuned process models using the plurality of product quality parameters from the second plurality of products, wherein the tuning estimates a changed state of the processing; estimating new values for the plurality of process control variables from the tuned models; processing a third plurality of products at the new values of the plurality of process control variables; measuring the plurality of product quality parameters on the third plurality of products; repeating the tuning of the process models and the estimating new values for the plurality of process control variables if the quality control parameters from the third plurality of products are not acceptable; otherwise continuing processing products with the new values of the plurality of process control variables if the quality control parameters from the third plurality of products are acceptable.

Other References

  • The Process Control Systems in Sub-0.5 Micron Factories, P. K. Mozumder, presented at International Symposium on Semiconductor Manufacturing in Austin, Tex., Sep. 20, 1993
  • A Monitor Wafer Based Controller for PECVD Silicon Nitride Process on AMT, P. K. Mozumder, et al., IEEE/SEMI Advanced Semiconductor Manufacturing Conference, Presented Oct., 1993, pp. 136-14
PatentsPlus Images
Enhanced PDF formats
loading...
PatentsPlus: add to cart
PatentsPlus: add to cartSearch-enhanced full patent PDF image
$9.95more info
PatentsPlus: add to cart
PatentsPlus: add to cartIntelligent turbocharged patent PDFs with marked up images
$16.95more info
 
Sign InRegister
Username  
Password   
forgot password?