Polyurethane thickeners in latex compositions
Polymers with hydrophobe bunches
Acrylic emulsion copolymers for thickening aqueous systems and copolymerizable surfactant monomers for use therein
Photosensitive resin composition
Water-borne, alkali-developable, photoresist coating compositions and their preparation Patent #: 5045435
ApplicationNo. 238133 filed on 05/04/1994
US Classes:430/281.1, Radiation sensitive composition comprising ethylenically unsaturated compound430/906, Polyamide or polyurethane430/910, Polymer of unsaturated acid or ester522/85, Reacting an ethylenic monomer in the presence of a solid polymer522/110At least one solid polymer derived from ethylenic monomers has at least two ethylenic groups
ExaminersPrimary: Brammer, Jack P.
Attorney, Agent or Firm
Foreign Patent References
International ClassG03C 001/73
AbstractA waterborne photoimageable composition or photoresist comprises a latex binder polymer having acid functionality to render it developable in alkaline aqueous solution, which acid functionality is neutralized to at least about 1 mole percent with an amino acrylate, a photopolymerizeable monomer fraction, and a photoinitiator chemical system.