Waterborne photoresists having binders neutralized with amino acrylates
Patent 5393643 Issued on February 28, 1995. Estimated Expiration Date: 
May 4, 2014. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
May 4, 2014. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 3929743 Polyurethane thickeners in latex compositions Polymers with hydrophobe bunches Acrylic emulsion copolymers for thickening aqueous systems and copolymerizable surfactant monomers for use therein Photosensitive resin composition Water-borne, alkali-developable, photoresist coating compositions and their preparation Patent #: 5045435 InventorsAssigneeApplicationNo. 238133 filed on 05/04/1994US Classes:430/281.1, Radiation sensitive composition comprising ethylenically unsaturated compound430/906, Polyamide or polyurethane430/910, Polymer of unsaturated acid or ester522/85, Reacting an ethylenic monomer in the presence of a solid polymer522/110At least one solid polymer derived from ethylenic monomers has at least two ethylenic groupsExaminersPrimary: Brammer, Jack P.Attorney, Agent or FirmForeign Patent References
International ClassG03C 001/73AbstractA waterborne photoimageable composition or photoresist comprises a latex binder polymer having acid functionality to render it developable in alkaline aqueous solution, which acid functionality is neutralized to at least about 1 mole percent with an amino acrylate, a photopolymerizeable monomer fraction, and a photoinitiator chemical system. |
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