Laser pattern generation apparatus
Patent 5386221 Issued on January 31, 1995. Estimated Expiration Date: 
November 2, 2012. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
November 2, 2012. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References Re33931 Electro-optic pulse imaging raster output scanner Steering mirror Laser pattern generation apparatus Beam splitting apparatus Pattern generation system Patent #: 4956650 InventorsAssigneeApplicationNo. 970480 filed on 11/02/1992US Classes:347/239Specific light modulatorExaminersPrimary: Reinhart, Mark J.Attorney, Agent or FirmInternational ClassB41J 002/435AbstractAn improved laser pattern generation apparatus. The improved pattern generation apparatus of the present invention uses a laser beam to expose a radiant sensitive film on the workpiece to print circuit patterns on a substrate. The laser beam is aligned using a beam steering means. The laser beam is split into 32 beams to create a brush. The brush scans the workpiece through use of a rotating polygonal mirror. Each beam of the brush may have one of seventeen intensity values. The beams are modulated by an Acousto-Optical Modulator. Signals provided to the Acousto-Optical Modulator define the pattern to be generated. These signals are created by a rasterizer. Increased print speed is accomplished through the use of a wider brush and a print strategy that eliminates physical stage passes.Other References
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