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High-temperature, uncooled diode laser

Patent 5381434 Issued on January 10, 1995. Estimated Expiration Date: Icon_subject March 30, 2013. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

InP-based quantum-well laser
Patent #: 5040186
Issued on: 08/13/1991
Inventor: Logan, et al.

Quantum-well diode laser Patent #: 5251225
Issued on: 10/05/1993
Inventor: Eglash, et al.

Inventors

Assignee

Application

No. 039771 filed on 03/30/1993

Examiners

Primary: Davie, James W.

Attorney, Agent or Firm

International Class

H01S 003/19

Abstract

A semiconductor diode laser comprising an active layer (12) having multiple compressively strained quantum wells (54) of AlGaInAs sandwiched between barriers (52) of AlGaInAs lattice-matched to InP and of a precisely defined bandgap dependent on the composition of the quantum wells. The active layer is surrounded by oppositely doped cladding layers (48, 50, 52, 58, 60) so as to form an optical waveguide. The laser very efficiently emits 1.3-μm light, particularly at high operating temperatures.

Other References

  • C. E. Zah et al., "Low threshold 1.3 μm strained-layer Alx Gay In1-x-y As quantum well lasers," Electronics Letters, Dec. 1992, vol. 28, pp. 2323-2324
  • R. Bhat et al., "Low Threshold 1.3 and 1.55 μm Strained Quantum Well Lasers," Extended Abstracts of the 1992 International Conference on Solid State Devices and Materials, Tsukuba, 1992, pp. 604-606 (no month)
  • A. Kasukawa et al., "1.5 μm GaInAs/AlGaInAs Graded-Index Separate-Confinement-Heterostructure Quantum Well Laser Diodes Grown by Organometallic Chemical Vapor Deposition," Japanese Journal of Applied Physics, May 1992, vol. 31, pp. 1365-1371
  • P. J. A. Thijs et al., "High Output Power (380 mW), Low Threshold Current (1.3 mA), Low Linewidth Enhancement Factor (ࣘ2) λ=1.3 μm Strained Quantum Well Lasers," Technical Digest, 1991, 17th ECOC, vol. 2, pp. 48-51 (no month)
  • A. Kasukawa et al., "Very low threshold current density 1.5 μm GaInAs/AlGaInAs graded-index separate-confinement-heterostructure strained quantum well laser diodes grown by organometallic chemical vapor deposition," Applied Physics Letters, vol. 59, pp. 2486-2488, Nov. 1991
  • R. Bhat et al., "OMCVD growth of strained Alx Gay In1-x-y As for low threshold 1.3 μm and 1.55 μm quantum well lasers," 4th International Conference on Indium Phosphide and Related Materials: Conference Proceedings, Newport, R.I., Apr. 21-24, 1992, pp. 453-45
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