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Apparatus and method for erasing a flash EEPROM

Patent 5357476 Issued on October 18, 1994. Estimated Expiration Date: Icon_subject June 1, 2013. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

Electrically erasable memory with self-limiting erase
Patent #: 4267558
Issued on: 05/12/1981
Inventor: Guterman

Non-volatile semiconductor memory device erasing operation
Patent #: 4996571
Issued on: 02/26/1991
Inventor: Kume, et al.

Apparatus for providing block erasing in a flash EPROM
Patent #: 5065364
Issued on: 11/12/1991
Inventor: Atwood, et al.

Single transistor non-volatile electrically alterable semiconductor memory device with a re-crystallized floating gate
Patent #: 5067108
Issued on: 11/19/1991
Inventor: Jenq

Erase circuitry for a non-volatile semiconductor memory device
Patent #: 5095461
Issued on: 03/10/1992
Inventor: Miyakawa, et al.

Electrically page erasable and programmable read only memory
Patent #: 5109361
Issued on: 04/28/1992
Inventor: Yim, et al.

Nonvolatile memory cell
Patent #: 5130769
Issued on: 07/14/1992
Inventor: Kuo, et al.

Method and apparatus for erasing an array of electrically erasable EPROM cells
Patent #: 5138576
Issued on: 08/11/1992
Inventor: Madurawe

Methods of repairing field-effect memory cells in an electrically erasable and electrically programmable memory device Patent #: 5233562
Issued on: 08/03/1993
Inventor: Ong, et al.

Inventors

Assignee

Application

No. 069327 filed on 06/01/1993

US Classes:

365/185.12, Parallel row lines (e.g., page mode)365/185.26, Floating electrode (e.g., source, control gate, drain)365/185.3, Over erasure365/185.33Flash

Examiners

Primary: LaRoche, Eugene R.
Assistant: Nguyen, Tan T.

Attorney, Agent or Firm

International Class

G11C 011/34

Abstract

A flash EEPROM array (22) is erased and a threshold voltage distribution of the erased flash EEPROM cells (36, 39-46) is converged to within a predetermined voltage range by using a two-step erasing procedure. In the first step, flash EEPROM array (22) is electrically bulk erased using a conventional bulk erase procedure. Electrons are tunneled from the floating gate (38) to the source, causing cells (36, 39-46) to have a relatively low threshold voltage. In the second step, the threshold voltage distribution of the array (22) is converged to within the predetermined voltage range by grounding the source and drain of each cell (36, 39-46), while concurrently applying a high positive voltage to the control gate (27) of each cell (36, 39-46). Some electrons are tunneled back to the floating gate (38), thus converging the threshold voltage distribution to within a predetermined range.

Other References

  • ULSI Device Development Laboratories, NEC Corp., "A Novel Erasing Technology for 3.3 V Flash Memory with 64 Mb Capacity and Beyond", K. Oyama, IEEE, Apr. 1992, IEDM, pp. 607-610
  • ULSI Research Center Toshiba Corp., "New Write/Erase Operation Tech. for Flash EEPROM Cells to Improve the Read Disturb Characteristics", T. Endoh, IEEE, Apr. 1992, IEDM, pp. 603-606
  • IEEE Journal of Solid-State Circuits, "High-Voltage Regulation and Process Considerations for High Density 5 V-Only E2PROM's", Duane H. Oto, vol. SC-18, No. 5, Oct. 1983
  • Semiconductor Device Engineering Laboratory, Toshiba, Corp., "A Self-Convergence Erasing Scheme for a Simple Stacked Gate Flash EEPROM", Seiji Yamada, IEEE, Sep. 1991, IEDM, pp. 307-31
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