Polymerization reactor
December 15, 2012. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesTreating polymeric surfaces Method for bonding silicone elastomers to metal substrates Apparatus for processing semiconductor wafers or the like Method of making a capacitor winding Photoconducting amorphous carbon Method and apparatus for automated polymeric film coating Method of interiorly coating tubing Inorganic powders with improved dispersibility Process for applying a composite insulative coating to a substrate Patent #: 4921723 InventorsAssigneeApplicationNo. 990683 filed on 12/15/1992US Classes:118/723MW, Microwave gas energizing means (e.g., 2.45 gigahertz, microwave plasma, etc.)118/719, Multizone chamber118/723E, Having glow discharge electrodes (e.g., DC, AC, RF, etc.)118/730RotaryExaminersPrimary: Breneman, R. BruceAssistant: Baskin, Jonathan D. Attorney, Agent or FirmInternational ClassC23C 016/50AbstractAn apparatus adapted for depositing one or more polymeric materials on the surface of a substrate, which apparatus includes a polymerization chamber; an inlet for admitting a glow discharge polymerization precursor into the polymerization chamber; a first conductive member extending into the polymerization chamber; a first conductive support attached to the first conductive member for holding a substrate; a power generator arranged for transmitting electrical energy to the first conductive member; a second conductive member on or within the polymerization chamber, the second conductive member being spaced and insulated from the first conductive member; and a pump arranged for applying a vacuum to the polymerization chamber; whereby a glow discharge zone is established within the polymerization chamber when a vacuum is applied thereto and electrical energy from the first conductive member is received by the second conductive member. Also disclosed are a process of depositing polymeric materials on the surface of a substrate, which can be conveniently practiced using the above-described apparatus, and a product thereof.Other References
Field of SearchMicrowave gas energizing means (e.g., 2.45 gigahertz, microwave plasma, etc.)Producing energized gas remotely located from substrate with magnet (e.g., electron cyclotron resonance, etc.) Having antenna Having glow discharge electrodes (e.g., DC, AC, RF, etc.) Producing energized gas remotely located from substrate Radio frequency antenna or radio frequency inductive coil discharge means Producing energized gas remotely located from substrate Multizone chamber Rotary By means to heat or cool With magnet (e.g., electron cyclotron resonance, etc.) | |
