U.S. patents available from 1976 to present.
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Diamond growth by microwave generated plasma flame

Patent 5349154 Issued on September 20, 1994. Estimated Expiration Date: Icon_subject December 17, 2012. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

Method of and apparatus for igniting a high-frequency torch to create a high-temperature plasma of high purity
Patent #: 4665296
Issued on: 05/12/1987
Inventor: Iwata ,   et al.

Method for treating a material using radiofrequency waves
Patent #: 4777336
Issued on: 10/11/1988
Inventor: Asmussen

Microwave plasma production apparatus
Patent #: 4908492
Issued on: 03/13/1990
Inventor: Okamoto, et al.

Microwave plasma torch, device comprising such a torch and process for manufacturing powder by the use thereof
Patent #: 4924061
Issued on: 05/08/1990
Inventor: Labat, et al.

Intra-microspray ICP torch
Patent #: 4990740
Issued on: 02/05/1991
Inventor: Meyer

Microwave induced plasma torch with tantalum injector probe
Patent #: 5051557
Issued on: 09/24/1991
Inventor: Satzger

Spectroscopic plasma torch for microwave induced plasmas
Patent #: 5083004
Issued on: 01/21/1992
Inventor: Wells, et al.

Method for deposition of hexagonal diamond using hydrogen plasma jet Patent #: 5243170
Issued on: 09/07/1993
Inventor: Maruyama, et al.

Inventors

Assignee

Application

No. 994060 filed on 12/17/1992

US Classes:

117/102, With significant flow manipulation or condition, other than merely specifying the components or their sequence or both117/103, Using an energy beam or field, a particle beam or field, or a plasma (e.g., ionization, PECVD, CBE, MOMBE, RF induction, laser)117/929, Carbon (e.g., diamond) {C30B 29/04}219/121.41, Methods219/121.43, With chamber219/121.49, Cooling system219/121.51, Gas supply system219/121.59, Methods219/686, Gas environment (e.g., pressurized, etc.)427/575Generated by microwave (i.e., 1mm to 1m)

Examiners

Primary: Paschall, Mark H.

Attorney, Agent or Firm

Foreign Patent References

  • 1308900 JP. 12/13/1989

International Class

B23K 010/00

Abstract

A swirl flow microwave plasma torch is provided for the growth of diamond films. The swirl flow torch incorporates an injection nozzle that directs reactant gases into a cylindrical flow tube extending through the center of a tuned microwave cavity. The outer surface of the nozzle comprises a contoured, conical shape that causes inert gas, directed tangentially against the outer surface of the nozzle, to swift in a helical path that surrounds and confines the reactant gas emerging from the nozzle. The tuned cavity is coupled to a microwave energy source to generate a highly localized plasma in the reactant gas in the center of the sheathing swirl of inert gas. The swirl of inert gas contains the plasma in a well-defined shape, prevents in-diffusion of undesirable gases, forms a boundary layer to prevent plasma migration, and provides flow tube cooling. The reactant gas flow forces the plasma out of the flow tube to form a plasma flame that can be impinged on a substrate to induce diamond growth.

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