Plastic film having a coating layer comprising a copolyester and a conductive polymer and light-sensitive photographic material using the same

Patent 5334457 Issued on August 2, 1994. Estimated Expiration Date:

September 10, 2011. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Abstract Claims Description Full Text

Patent References

Photographic element in which the antistatic layer is interlinked in the base
Patent #: 4225665
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Inventors

Assignee

Konica Corporation

Application

No. 757247 filed on 09/10/1991

US Classes:

428/480, Of polyester (e.g., alkyd, etc.)428/482, Of cross-linked polyester430/529, Organic carboxylic, sulfur or phosphorus acid or salt430/533, Polyester or polycarbonate430/908, Polyester430/927Radiation-activated cross-linking agent containing

Examiners

Primary: Thibodeau, Paul J.
Assistant: Le, H. Thi

Attorney, Agent or Firm

Frishauf, Holtz, Goodman & Woodward

Foreign Patent References

0078559 EP. 05/13/1983
0191302 EP. 08/13/1986
0376693 EP. 07/13/1990
152530 JP. 09/13/1982

International Class

B32B 027/06

Foreign Application Priority Data

1990-09-12 JP

Abstract

There are disclosed a plastic resin film which comprises a polyester resin composition comprising at least two components of (A) a polyester copolymer and (B) a polymer having conductivity, preferably having a number average molecular weight of 500 to 5000, being laminated on at least one surface of a plastic film support; a light-sensitive photographic material which comprises at least one silver halide emulsion layer being laminated on said film laminate or plastic film; and a method for preparing a plastic film which comprises coating an aqueous solution of the polyester resin composition on at least one surface of a non-oriented plastic film support or uniaxially oriented plastic film support, stretching the coated support to at least monoaxial direction and then completing orientation crystallization.