Patent ReferencesApparatus for washing opposite surfaces of a substrate Disk washing apparatus Cleaning brush for semiconductor wafer Patent #: 5144711 InventorsAssigneeApplicationNo. 998076 filed on 12/28/1992US Classes:15/21.1, Brushing15/88.2, Work moves past rotatable brush15/97.1WipingExaminersPrimary: Roberts, Edward L.Attorney, Agent or FirmInternational ClassB08B 011/02Foreign Application Priority Data1991-12-27 JPAbstractA scrubber cleaner for cleaning the unsucked face and peripheral chamfers of a semiconductor wafer. A wafer holder capable of holding the wafer by vacuum suction and turning the wafer circumferentially, and including a wafer suction head for fixing the wafer on it and a motor to rotate the suction head. A brush assembly including a rotatory plate having a brushing surface on one side consisting of a flat ring portion and a side-of-cylinder portion, and being capable of shifting axially and in radial directions; a motor for rotating the rotatory plate circumferentially; an air cylinder for shifting the rotatory plate axially; and another air cylinder for shifting the rotatory plate in radial directions. The side-of-cylinder portion of the brushing surface axially extends from the inner boundary of the ring portion, and the rotatory plate is disposed such that the flat ring portion of the brushing surface of the brush is opposed to and in parallel to the unsucked face of the wafer which is held on the suction head. | |