U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Scrubber apparatus for cleaning a thin disk work

Patent 5282289 Issued on February 1, 1994. Estimated Expiration Date: Icon_subject December 28, 2012. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

Apparatus for washing opposite surfaces of a substrate
Patent #: 4811443
Issued on: 03/14/1989
Inventor: Nishizawa

Disk washing apparatus
Patent #: 5092011
Issued on: 03/03/1992
Inventor: Gommori, et al.

Cleaning brush for semiconductor wafer Patent #: 5144711
Issued on: 09/08/1992
Inventor: Gill, Jr.

Inventors

Assignee

Application

No. 998076 filed on 12/28/1992

US Classes:

15/21.1, Brushing15/88.2, Work moves past rotatable brush15/97.1Wiping

Examiners

Primary: Roberts, Edward L.

Attorney, Agent or Firm

International Class

B08B 011/02

Foreign Application Priority Data

1991-12-27 JP

Abstract

A scrubber cleaner for cleaning the unsucked face and peripheral chamfers of a semiconductor wafer. A wafer holder capable of holding the wafer by vacuum suction and turning the wafer circumferentially, and including a wafer suction head for fixing the wafer on it and a motor to rotate the suction head. A brush assembly including a rotatory plate having a brushing surface on one side consisting of a flat ring portion and a side-of-cylinder portion, and being capable of shifting axially and in radial directions; a motor for rotating the rotatory plate circumferentially; an air cylinder for shifting the rotatory plate axially; and another air cylinder for shifting the rotatory plate in radial directions. The side-of-cylinder portion of the brushing surface axially extends from the inner boundary of the ring portion, and the rotatory plate is disposed such that the flat ring portion of the brushing surface of the brush is opposed to and in parallel to the unsucked face of the wafer which is held on the suction head.

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