Method of forming ternary metal fluoride films by the decomposition of metallo-organic compounds in the presence of a fluorinating agent
Patent 5271956 Issued on December 21, 1993. Estimated Expiration Date: 
December 30, 2011. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
December 30, 2011. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 3663280 Method of producing mouldings and layers of inorganic materials Method of preparing coatings of metal carbides and the like Thin films of metal phosphates and the method of their formation Method for forming thin MgF2 film and low-reflection film Method for preparing PLZT, PZT and PLT sol-gels and fabricating ferroelectric thin films Patent #: 5116643 InventorApplicationNo. 814530 filed on 12/30/1991US Classes:427/108, Transparent base427/100, Piezoelectric properties427/126.1, Metallic compound coating427/162, OPTICAL ELEMENT PRODUCED427/164, Transparent base427/165, Glass427/226, HEAT DECOMPOSITION OF APPLIED COATING OR BASE MATERIAL427/229, Coating decomposed to form metal427/240, CENTRIFUGAL FORCE UTILIZED427/430.1IMMERSION OR PARTIAL IMMERSIONExaminersPrimary: Bell, JanyceAttorney, Agent or FirmInternational ClassB05D 005/12AbstractA process is disclosed of forming a film of a ternary metal fluoride in which there is combined a solvent solution, a mixture of metallo-ogranic compounds, and an organic fluoride to form a casting liquid. The casting liquid is then coated by a method such as dip coating or spin coating to form a coating on a substrate. The coated substrate is then heated to decompose the metallo-organic compounds and organic fluoride resulting in recovery of a termary metal fluoride coated substrate. The ternary metal fluorides formed are fluorides of at least one alkaine earth metal and at least one fourth period divalent transition metal having an atomic number of from 22 to 30 inclusive. | |
