U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Pulsed laser photoemission electron-beam probe

Patent 5270643 Issued on December 14, 1993. Estimated Expiration Date: Icon_subject August 12, 2012. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

3796947

High frequency test head using electro-optics
Patent #: 4862075
Issued on: 08/29/1989
Inventor: Choi ,   et al.

Ultra-high-speed digital test system using electro-optic signal sampling
Patent #: 4875006
Issued on: 10/17/1989
Inventor: Henley, et al.

Electron beam measuring instrument
Patent #: 4963823
Issued on: 10/16/1990
Inventor: Otto, et al.

Electro-optic sampling system clock and stimulus pattern generator
Patent #: 5095262
Issued on: 03/10/1992
Inventor: Henley, et al.

Method and apparatus for electro-optically measuring a voltage signal
Patent #: 5157327
Issued on: 10/20/1992
Inventor: Henley

Capacitance imaging system using electro-optics Patent #: 5170127
Issued on: 12/08/1992
Inventor: Henley

Inventors

Assignee

Application

No. 928919 filed on 08/12/1992

US Classes:

324/751, Using electron beam probe324/73.1, PLURAL, AUTOMATICALLY SEQUENTIAL TESTS324/96Using radiant energy

Examiners

Primary: Nguyen, Viet Q.

Attorney, Agent or Firm

Foreign Patent References

  • 0348785 EP. 01/12/1990
  • 0357440 EP. 03/12/1990
  • 9002955 WO. 03/12/1990

International Class

G01R 027/26

Abstract

An electron-beam test probe system (400) in which a pulsed laser-beam source (404) and a photocathode assembly (430) are used with an electron-beam column (426) to produce a pulsed electron beam at a stabilized repetition frequency. A pulse picker (414) allows the pulse repetition frequency of the pulsed electron beam to be reduced to a submultiple of the pulsed laser repetition frequency. A test pattern generator (416) is programmable to apply a desired pattern of test vector patterns to an electronic circuit to be probed, the test vector patterns being synchronized with the stabilized laser-beam pulse repetition frequency. A timebase circuit (412) allows the test vector patterns to be time-shifted relative to the pulsed electron beam. The electronic circuit under test can thus be probed at any desired point in the applied test vector pattern by control of the pulse picker and by time-shifting the test vector pattern.

Other References

  • M. Brunner et al., Non-Invasive Waveform Measurements of IC-Internal GHz Signals in a ps Time Scale, Microelectronic Engineering, vol. 9, Nos. 1-4, May 1989, Amsterdam, NL, pp. 405-410
  • R. Schmitt et al., Applications of High-Speed Electron-Beam Testing in Solid State Electronics, Microelectronic Engineering, vol. 12, Nos. 1-4, May 1990, Amsterdam, NL, pp. 279-286
  • P. May et al., Picosecond photoelectron microscope for high-speed testing of integrated circuits, IBM Journal of Research and Development, vol. 34, No. 2/3, Mar./May 1990, Armonk, N.Y., pp. 204-214
  • K. Weingarten et al, Picosecond Optical Sampling of GaAs Integrated Circuits, IEEE Journal of Quantum Electronics, vol. 24, No. 2, Feb. 1988, New York, N.Y., pp. 198-22
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