U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Indirect temperature-measurement of films formed on semiconductor wafers

Patent 5249142 Issued on September 28, 1993. Estimated Expiration Date: Icon_subject April 3, 2012. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

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Inventors

Assignee

Application

No. 864185 filed on 04/03/1992

US Classes:

702/135, Infrared250/339.04, Including temperature determining means356/45, Plural color responsive374/121, By thermally emitted radiation374/132Sensor or mounting temperature control

Examiners

Primary: Harvey, Jack B.
Assistant: Pipala, Edward

Attorney, Agent or Firm

International Class

G01J 005/00

Foreign Application Priority Data

1989-03-31 JP

Abstract

A method of measuring the temperature of a matter accurately, in non-contact fashion and without setting any emissivity comprising obtaining a spectral characteristics of absorbing electromagnetic waves inherent to a matter whose temperature is to be measured, obtaining those absorption peak wavelengths of the electromagnetic waves which correspond to two or more high points of electromagnetic wave absorption rate obtained from the spectral characteristics, measuring amounts of the electromagnetic waves, which have the absorption peak wavelengths, radiated from the temperature-measured matter, and calculating the temperature of the matter from blues of the radiant amounts of the electromagnetic waves thus measured.

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