Fluid flow control method and apparatus for minimizing particle contamination
July 15, 2012. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesPressure sensing method and apparatus for gases Generation of high vacuums Method of producing a high vacuum in a container Pressure regulator for fluid pressures Mass flow/pressure control system Method and apparatus for regulating fluid flow Method and apparatus for improving the yield of integrated circuit devices Method and apparatus for venting vacuum processing equipment Pressure regulator Patent #: 4936340 InventorApplicationNo. 913731 filed on 07/15/1992US Classes:141/8, Vacuum137/14, Involving pressure control141/4Gas or variation of gaseous condition in receiverExaminersPrimary: Recla, Henry J.Assistant: Jacyna, Casey Attorney, Agent or FirmInternational ClassesG05D 016/00F16K 024/04 AbstractA fluid flow control for use with a process chamber. In the disclosed embodiment, the process chamber is for ion implantation of a workpiece and the fluid flow control is to assure the flow rates are maintained at values which are efficient in evacuating and pressurizing the chamber but are not high enough to dislodge particulate contaminants from the process chamber walls. In the disclosed design, the invention has utility both in instances in which wafers are directly inserted into the process chamber for ion implantation and in which the wafers are inserted into the chamber by use of a load-lock which avoids the requirement that the process chamber be cyclicly pressurized and depressurized.Field of SearchGas or variation of gaseous condition in receiverVacuum DIVERSE FLUID CONTAINING PRESSURE FILLING SYSTEMS INVOLVING RECEIVER GAS CONTENT MODIFICATION EVACUATION APPARATUS With filling with gas COMBINED Involving pressure control Responsive to change in rate of fluid flow Control by pressures across flow line valve Electrically actuated valve IRRADIATION OF OBJECTS OR MATERIAL Irradiation of semiconductor devices Ion or electron beam irradiation APPARATUS FOR MOVING MATERIAL BETWEEN ZONES HAVING DIFFERENT PRESSURES AND INHIBITING CHANGE IN PRESSURE GRADIENT THEREBETWEEN Including serially arranged valves in path having a vertical component (e.g., airlocks, etc.) | |
