U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Emissivity independent temperature measurement systems

Patent 5226732 Issued on July 13, 1993. Estimated Expiration Date: Icon_subject April 17, 2012. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

3581570

Radiation measurement of a product temperature in a furnace
Patent #: 4144758
Issued on: 03/20/1979
Inventor: Roney

Method and apparatus for measuring emissivity
Patent #: 4408878
Issued on: 10/11/1983
Inventor: Fischbach

Emissivity calibration apparatus and method
Patent #: 4854727
Issued on: 08/08/1989
Inventor: Pecot ,   et al.

Emissivity correction apparatus and method
Patent #: 4919542
Issued on: 04/24/1990
Inventor: Nulman, et al.

High energy laser mask and method of making same
Patent #: 4923772
Issued on: 05/08/1990
Inventor: Kirch, et al.

Method for measuring surface temperature of semiconductor wafer substrate, and heat-treating apparatus
Patent #: 4979134
Issued on: 12/18/1990
Inventor: Arima, et al.

Emissivity calibration apparatus and method
Patent #: 4989991
Issued on: 02/05/1991
Inventor: Pecot, et al.

Pyrometer apparatus and method
Patent #: 5061084
Issued on: 10/29/1991
Inventor: Thompson, et al.

Directional spectral emissivity measurement system
Patent #: 5098195
Issued on: 03/24/1992
Inventor: Halyo, et al.

More ...

Inventors

Application

No. 876722 filed on 04/17/1992

US Classes:

374/133, Ambient temperature compensated (e.g., dummy sensor)250/338.1, Infrared responsive374/126Having emissivity compensating or specified radiating surface

Examiners

Primary: Cuchlinski, William A. Jr.
Assistant: Gutierrez, Diego

Attorney, Agent or Firm

Foreign Patent References

  • 0131523 JP 08/13/1983
  • 0167929 JP 10/13/1983
  • 0171643 JP 10/13/1983
  • 0253939 JP 12/13/1985
  • 0130834 JP 06/13/1986
  • 2082767 GB 03/13/1982

International Classes

G01J 005/06
G01J 005/02

Abstract

An improved contactless temperature measurement system is provided which includes a workpiece, a chamber containing the workpiece with the walls thereof being substantially transmissive to radiation at wavelengths other than a given wavelength and substantially reflective at the given wavelength to remove the dependence of the apparent or measured temperature on the workpiece emissivity variations or fluctuations.

Other References

  • "Emissivity issues in pyrometric temperature monitoring for RTP system" by J. Nulman, SPIE vol. 1189 Rapid Isothermal Processing (1989), pp. 72 to 82
  • "Pyrometry Emissivity Measurements and Compensation in an RTP Chamber" by J. Nulman et al, Materials Research Society Symposium Proceedings, 1989, vol. 146, pp. 461 to 466
  • "A double-wedge reflector for emissivity enhanced pyrometry" by J. C. Krapez et al, National Research Council Canada, Industrial Materials Research Institute, 1990, pp. 857 to 864
  • "Reflecting-cavity IR temperature sensors: an analysis of spherical, conical and double-wedge geometries" by J. C. Krapez et al, SPIE, vol. 1320, Infrared Technology and Applications, 1990, pp. 186 to 201
  • "Infrared Temperature Measurement with Automatic Correction of the Influence of Emissivity" by V. Tank, Infrared Physics, vol. 29, No. 2-4, 1989, pp. 211 to 212
  • Principles of Optics, by M. Born et al, A Pergamon Press Book, 1964, pp. 51 to 7
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