Patent References 3581570 Radiation measurement of a product temperature in a furnace Method and apparatus for measuring emissivity Emissivity calibration apparatus and method Emissivity correction apparatus and method High energy laser mask and method of making same Method for measuring surface temperature of semiconductor wafer substrate, and heat-treating apparatus Emissivity calibration apparatus and method Pyrometer apparatus and method Directional spectral emissivity measurement system InventorsApplicationNo. 876722 filed on 04/17/1992US Classes:374/133, Ambient temperature compensated (e.g., dummy sensor)250/338.1, Infrared responsive374/126Having emissivity compensating or specified radiating surfaceExaminersPrimary: Cuchlinski, William A. Jr.Assistant: Gutierrez, Diego Attorney, Agent or FirmForeign Patent References
International ClassesG01J 005/06G01J 005/02 AbstractAn improved contactless temperature measurement system is provided which includes a workpiece, a chamber containing the workpiece with the walls thereof being substantially transmissive to radiation at wavelengths other than a given wavelength and substantially reflective at the given wavelength to remove the dependence of the apparent or measured temperature on the workpiece emissivity variations or fluctuations.Other References
Field of SearchTransparent material measurement or compensation (e.g., spectral line, gas, particulate suspensionHaving emissivity compensating or specified radiating surface Having significant frequency limitation or relationship (e.g., peak, ratio) Having significant signal handling circuitry (e.g., linearizing, emissivity compensation) Ambient temperature compensated (e.g., dummy sensor) Plural color responsive Infrared responsive | |