Patent ReferencesSemiconductor vapor phase growing apparatus Valve control unit and system for use therewith Telecontrol system Method and apparatus for operating one or more deposition systems Electronic control system for controlling several remote devices Gas cylinder monitor and control system Apparatus and method for controlling functions of automated gas cabinets Microprocessor controlled liquid chemical delivery system and method Patent #: 5014211 InventorsAssigneeApplicationNo. 576067 filed on 08/31/1990US Classes:700/282, Flow control (e.g., valve or pump control)340/3.1, Monitoring in addition to control (e.g., supervisory)340/3.71Having manual control inputExaminersPrimary: Lall, Parshotam S.Assistant: Pipala, E. J. Attorney, Agent or FirmInternational ClassesG05B 023/00G05B 009/03 AbstractA plurality of gas flow control units in cabinets are connected to distribute process gas, on demand, to a plurality of utilization locations known as "tool" locations in a semi-conductor manufacturing plant. Each gas flow control unit is connected to a single tool interface controller over a single communications cable. The status and operational characteristics of the individual units are communicated through the tool interface controller to a supervisory control computer by means of polling. Each flow control cabinet has its own data processor, and can be operated alone. Also, the supervisory computer can be used to operate each cabinet, as well as to monitor operations of the system. Gas demand and other signals are communicated from each tool location to the control units through a single cable connected to the interface controller, thus reducing the original wiring cost. Changing the communications path to accompany a change of the tool to which a given conduit in one of the cabinets delivers its gas can be done quickly, in software, with a few keystrokes. Mechanical re-wiring is not needed. | |